Mask Plate | Rapid Particle Detection System for Protective Film Surface

FastmicroMask Plate | Rapid Particle Detection System for Protective Film Surface（PDS）

Mask Plate | Rapid Particle Detection System for Protective Film Surface（PDS）Provide high-throughput surface particle contamination detection services for mask plates, mask protective films, and substrate manufacturing processes.

This system has high sensitivity to particles with a diameter greater than 0.1 µ m, making it an efficient and service-oriented choice. It can replace traditional particle detection systems with manual or automatic operation and lower maintenance costs.

Product Features:

• High throughput detection: capable of detecting 400 wafers per hour (WPH)

• Data output: According to ISO 14644-9 standard, output SCP level in user interface and PDF report

• Positive and negative detection: Complete the detection of both sides in a single measurement (without flipping)

• Detection range: capable of detecting polystyrene latex (PSL) equivalent particles ≥ 0.1 µ m (certified by NIST)

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Consistency measurement during the production process

Quick:Capable of completing large-area imaging within seconds

Quantitative:Suitable for quality identification and monitoring in production and research and development environments

Easy to operate:Unaffected by operators, automated, clean gripping method

Accurate:High resolution measurement (quantity, position, size)

uniformity:Maintain objectivity and stability in every measurement

High throughput:Can obtain results within the process time window

FM-PDS: Direct detection of surface particles

This system can be used for wafer manufacturing processes, next-generation compound semiconductors, and excellent packaging applicationsProvide high-throughput surface particle contamination detection services.

This system is suitable for particle sizes greater than 0.1μmThe particles have high sensitivity and are a type of high-sensitivityEfficient and service-oriented choices.

It can be operated manually or automatically, andLower maintenance costs, replacing traditional particle detection systems.

For the next generation of semiconductor production applications, the PDS system has the following attributes: double-sided identicalTime scanning (optional);

Static field of view scanning (without moving the product during image acquisition).

Multi functional modular platform

The system is designed for direct measurement of DUV (deep ultraviolet) and EUV (extreme ultraviolet) mask platesDeveloped for the level of particle contamination on the surface of protective films, masks, or other types of substrates.

The system can be customized and expanded according to customer needs. The measurement module can also provide OEM services for system integrators and original equipment manufacturers (OEMs)