ME Mapping spectroscopic ellipsometer

I. Overview

ME-MappingSpectral ellipsometer is a customizable Mapping and mapping measurement instrument, equipped with a fully automatic Mapping measurement module. Through the measurement of ellipsometry parameters, transmission/reflectivity, and other parameters, it can quickly achieve customized mapping, characterization, and analysis of thin film thickness and optical parameters on the entire substrate.

■Solution for full substrate ellipsoidal mapping measurement;

Support product design and customized functional modules, with one click drawing and measurement;

Configure Mapping module, with full substrate customization and multi-point positioning measurement capability;

Rich databases and geometric structure model libraries ensure powerful data analysis capabilities.

2、 Product Features

■Using a composite light source of deuterium lamp and halogen lamp, the spectrum covers the ultraviolet to near-infrared range (193-2500nm);

■High precision rotary compensator modulation and PCRSA configuration enable high-speed acquisition of Psi/Delta spectral data;

■It has the ability of full substrate user-defined multi-point automatic positioning and measurement, and provides full facial mask thickness detection and analysis report;

■Hundreds of material databases and multiple algorithm model libraries cover the vast majority of optoelectronic materials currently available.

3、 Product application

ME Mapping is widely used in industrial applications such as OLED, LED, photovoltaic, and integrated circuits to achieve rapid measurement and characterization of large-sized full substrate film thickness, optical constants, and film thickness distribution.

Optional accessories

Technical Specifications