IRE-200 film thickness tester

I. Overview

IRE-200Optical thin film thickness gaugeIt is an ultra high precision epitaxial layer thickness measurement device that uses infrared spectroscopy and Fourier transform for rapid analysis. It is mainly used for measuring the epitaxial layer thickness of various epitaxial wafers such as Si, GaAs, InP, SiC, GaN, etc.

■Multiple modes such as single throw/double throw are supported for selection;

■ Custom mapping function;

High detection rate: Si standard epitaxial wafer measurement at 25 points ≤ 3 minutes;

High detection accuracy: ≤ 0.01um.

2、 Product Features

1) The equipment adopts high-performance light source modules, with good light source stability, high signal-to-noise ratio, and a coverage range of 7800-350cm^-1.

2) Paired with self-developed algorithm software, it can accurately and quickly obtain measurement results.

3) Paired with our independently developed mapping exercise platform, it provides precise positioning and fast measurement speed.

3、 Product application

IRE-200 is widely used in the semiconductor industry for measuring the thickness of epitaxial layers on substrate materials such as Si, SiC, GaAs, InP, GaN, etc.

SiC EPI Measurement Case

Technical Specifications