Desktop automatic film thickness measurement and analysis system

NegotiableUpdate on 02/09

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Product Details

Wafer wafer epitaxial online film thickness monitoring is a key technology in semiconductor manufacturing, mainly using non-contact optical measurement methods to achieve real-time thickness monitoring and control during epitaxial growth process.

The NS-30 series is a desktop automatic film thickness measurement and analysis system produced by Suzhou Xishi Technology Co., Ltd., specifically designed for online film thickness monitoring of wafer epitaxy. This device adopts advanced optical measurement technology and has the characteristics of high precision, high stability, and intelligence, playing an important role in the field of semiconductor manufacturing.

　　1、 Core technical principles

The NS-30 series film thickness gauge is based on the principle of white light interference for measurement. The device vertically irradiates high stability wideband light onto the thin film on the surface of the wafer to be tested. The incident light is reflected on the surface of the thin film, and another part is transmitted into the thin film and reflected at the interface between the thin film and the substrate. These two reflected light beams interfere with each other to form an interference pattern. Through spectral analysis and regression algorithms, parameters such as thickness, refractive index, and reflectivity of each layer of the thin film can be calculated.

　　2、 Main technical parameters
主要技术参数

　　3、 Core functional features

1. High precision measurement capability

-Sub nanometer level accuracy: The measurement accuracy can reach 0.02nm, achieving nanometer level thin film thickness measurement;

-High repeatability: repeatability accuracy of 0.02nm, ensuring consistency and reliability of measurement results;

-Wide measurement range: covering a thickness measurement range of 1nm-250 μ m, meeting different application requirements;

2. Automated measurement function

-Automatic sample stage: platform size of 100mm-450mm is optional, supporting measurement of large-sized wafers;

-Intelligent point distribution: The software automatically generates measurement point distribution according to requirements and supports automatic measurement of multiple points;

-2D/3D mapping: Generate 2D and 3D distribution maps of parameters such as thickness, refractive index, reflectivity, etc;

3. Non contact non-destructive measurement

-Optical non-contact: using non-contact measurement to avoid damage to the wafer surface;

-Multi layer film measurement: capable of measuring the thickness and optical parameters of each layer of multi-layer composite films;

-Material adaptability: Suitable for transparent or semi transparent film layers, including oxides, nitrides, photoresists, and other materials;

　　4、 Application in Wafer Wafer Wafer Epitaxial Monitoring

1. Advantages of process control

The NS-30 series plays a key role in Wafer wafer epitaxy process:

-Real time monitoring: can perform online in-situ measurements in processes such as ALD atomic layer deposition and CVD chemical vapor deposition

-Process optimization: Real time adjustment and optimization of process parameters through precise feedback of film thickness data

-Quality assurance: Ensure the uniformity of epitaxial layer thickness, improve the performance and reliability of semiconductor devices

2. Improvement in measurement efficiency

-High speed measurement: Single measurement time less than 1 second, supports rapid batch detection

-Batch processing: Supports automatic transfer of 8-inch wafer boxes, significantly improving measurement efficiency

-Intelligent analysis: equipped with powerful analysis software, automatically performing SPC statistical analysis and data management

3. Expansion of application areas

In addition to wafer epitaxial monitoring, the NS-30 series is also widely used in:

-Semiconductor Manufacturing: Measuring SiO? 、 SiNx、 Key film layers such as polycrystalline silicon

-Photovoltaic cells: TOPCon's Al? O? /SiNx laminated film, HJT TCO transparent conductive film

-Optical coating: AR anti reflection layer, AG anti glare coating, filter, etc

-Display panel: Thickness measurement of thin film layers such as OLED, TFT, ITO, etc

The NS-30 series desktop automatic film thickness gauge, with its high precision, high stability, and intelligent characteristics, provides a reliable solution for online film thickness monitoring of wafer epitaxy, and plays an important role in high-tech fields such as semiconductor manufacturing, photovoltaics, and displays.