High resolution femtosecond laser direct lithography microfabrication system installed at the University of Science and Technology of China

Felles PhotonicThe high-resolution femtosecond laser direct lithography microfabrication system has been successfully installed at the Key Laboratory of Quantum Information, Chinese Academy of Sciences, University of Science and Technology of China, becoming another masterpiece representing the equipment and service level of our company's femtosecond laser microfabrication lithography machine

This high-resolution femtosecond laser direct lithography microfabrication system has the current level of femtosecond laser direct writing lithography microfabrication, providing reliable support for scientific research at the University of Science and Technology of China. It can be widely used in various applications such as ultraviolet femtosecond microfabrication, femtosecond micro nano processing, and femtosecond fine processing
This high-resolution femtosecond laser direct lithography microfabrication system has fully automated control processing function, automatic sample nano level positioning system, automatic adjustment of laser polarization and laser energy adjustment function, truly achieving worry free operation, very suitable for the exploration and research of laser micro nano processing.
The interaction between ultraviolet femtosecond laser and matter is a topic of study for Jian Duan. Ultraviolet light has higher photon energy and is more advantageous for micro nano processing of materials. The interaction between ultra fast ultraviolet laser and matter is worth exploring. However, the stable application of ultraviolet femtosecond laser is more difficult compared to fundamental light, which is a challengeFelles PhotonicAfter the breakthrough in the European center, it achieved stability and reliability comparable to fundamental frequency light, and emitted laser energy suitable for scientific research.