09,11,2026 7 views
On September 9, 2026, the 27th China International Optoelectronics Expo (CIOE) officially opened at the Shenzhen International Convention and Exhibition Center. Shenzhen Hairui Si Automation Technology Co., Ltd. (hereinafter referred to as "Hairui Si") showcased its mass spectrometry analysis series products at this exhibition, targeting the precision detection needs of industries such as semiconductors, new energy, and aerospace, presenting its product layout in the direction of gas detection and mass spectrometry analysis.
Hai Rui Si booth
Hai Rui Si focuses on the research and application of sealing detection, mass spectrometry leak detection, and mass spectrometry analysis. Since its establishment in 2008, Hai Rui Si has continuously promoted the upgrading of detection technology and built a complete technical system covering airtight detection, gas detection, mass spectrometry analysis, and mass spectrometry leak detection. The detection accuracy covers 10 ⁻¹ to 10 ⁻¹ Pa · m ³/s, which can meet different needs from large leak screening to extremely small leak detection. At present, Haier's products have been applied in fields such as liquid cooling, semiconductors, automobiles, new energy, aerospace, etc. The independent brand Hirays covers testing equipment, automation systems, customized chemical equipment, and fixtures, and has the ability to provide one-stop testing solutions from single machine equipment to whole line integration.
At this exhibition, Hai Rui Si highlighted the HM-130 high-performance residual gas analyzer、Multiple products including HM-150 high-pressure residual gas analyzer, HM-200 online mass spectrometer, and HM-230 multi pressure residual gas analyzer.
•HM-130 High Performance Residual Gas Analyzer
This exhibition showcasesHM-130 High Performance Residual Gas AnalyzerSpecially designed for semiconductor and vacuum processes, aimed at high vacuum environment applications. The minimum detectable voltage of this device is 2E-15Torr, with a scanning speed of 2ms/point and a mass range of 1-300amu. In semiconductor processes, it can be used for leak detection, vacuum diagnosis, hydrocarbon analysis, and other scenarios. Its high sensitivity can capture ultra-low concentration gas impurities, and its fast response capability can capture process transient changes in real time. Its wide mass range is compatible with qualitative and quantitative analysis of multiple scenarios and gases. The product is designed for harsh environments such as semiconductors and vacuum coating, emphasizing long-term stability and consistency in mass production processes.
•HM-150 High Pressure Residual Gas Analyzer
HM-150 High Pressure Residual Gas AnalyzerSpecially designed for high-pressure and harsh working conditions, with an upper working pressure limit of 2Pa and a minimum partial pressure detection limit of 2E-9Pa, coated with yttrium iridium oxide double filament or double tungsten filament, with a response speed of 2ms/point, it can be applied to high-sensitivity air leakage and pollution detection from high vacuum to PVD processes. The device has a dual mass number range of 1-50 amu and 1-100 amu, supports full spectrum scanning and specific mass number scanning, and can quickly perform qualitative and quantitative analysis on common gases such as H ₂, He, N ₂, O ₂, Ar, etc. Its high sensitivity detection capability helps to identify pollution sources and supports API integration and automatic monitoring alarm functions, which can be integrated into digital production lines.
•HM-200 online mass spectrometer
HM-200 online mass spectrometerThe residual gas analysis (RGA) method is adopted to meet the precision requirements of micrometer level leak detection, providing an online analysis solution for high-precision leak detection. This product emphasizes features such as core self-developed, integrated, no consumable cost, and multi cavity rotating testing, and is equipped with Hai Rui Si's one-stop service. Based on quadrupole mass spectrometry technology, HM-200 can directly detect electrolytes with high sensitivity and a wide range of mass numbers. It can be used for qualitative and quantitative analysis of residual gases in vacuum systems, real-time monitoring of process gases, and pollution tracing, meeting the needs of process validation and research and development. The detection process does not require the use of helium gas, which helps to reduce system operating costs; At the same time, this solution provides improvement ideas for the missed detection problems caused by gas flotation and electrolyte surface tension in traditional helium detection. The device conforms to ergonomic design and comes with a touch screen display, which can reduce operational load.
•HM-230 Multi pressure Residual Gas Analyzer
HM-230 Multi pressure Residual Gas AnalyzerIt is an online mass spectrometry analysis device that integrates RGA, vacuum system, and intelligent injection module, suitable for complex working conditions with multiple pressures. Its wide pressure range covers 1E-8Torr to 1.2atm, and one device can cover the full gradient pressure field, suitable for semiconductor processes such as ALD, CVD, PVD, and etching that require strict vacuum environments. This device provides three quality options of 1-100/200/300 amu, which can monitor key gas components such as H ₂, He, N ₂, O ₂, Ar in real time. It has a millisecond response speed and can track changes in process gas components in real time. When abnormal fluctuations are detected, an alarm is triggered in a timely manner. The integrated design highly integrates RGA, vacuum system, and injection module, without the need to build complex vacuum systems, allowing for immediate testing. In addition, the equipment adopts anti pollution coatings and surface passivation processes, which help reduce the pollution of process deposits on core components and extend their service life.
At this year's CIOE, Hai Rui Si showcased its technical capabilities in gas detection and mass spectrometry analysis, from core components to system integration, through the concentrated display of its mass spectrometry analysis series products. With the increasing demand for detection accuracy and process stability in industries such as semiconductors and new energy, Hairui Si's related product solutions provide more choices for industry users.
