The VTC-600GC-AM continuous multi chamber magnetron sputtering coating system is a newly independently developed coating equipment, mainly composed of a transfer chamber and a sputtering coating chamber. The substrate holder can achieve reciprocating motion in the transfer chamber and sputtering chamber, controlled by a frequency modulation motor, automatically synchronized operation, and the reciprocating position and motion speed can be set. Both chambers have positioning functions and can achieve origin reset. It can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc.
Product Introduction
VTC-600GC-AM Continuous Multi Chamber Magnetron Sputtering Coating SystemIt is a newly independently developed coating equipment, mainly composed of a transfer chamber and a sputtering coating chamber. The substrate holder can achieve reciprocating motion in the transfer chamber and sputtering chamber, controlled by a frequency modulation motor, automatically synchronized, and the reciprocating position and motion speed can be set. Both chambers have positioning functions and can achieve origin reset. It can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc.VTC-600GC-AM Continuous Multi Chamber Magnetron Sputtering Coating SystemMultiple target guns can be optionally equipped, with RF power supply for sputtering coating of non-conductive target materials and DC power supply for sputtering coating of conductive materials. Compared with similar devices, it is not only widely used, but also has the advantage of being small in size and easy to operate. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid-state electrolytes and OLEDs.
Main Features
It consists of two main parts: the transfer chamber and the sputtering coating chamber, which can achieve rapid and continuous sample injection sputtering coating.
Multiple target guns can be optionally equipped, with RF power supply for sputtering coating of non-conductive target materials and DC power supply for sputtering coating of conductive materials (target guns can be replaced according to customer needs).
It can prepare various thin films and has a wide range of applications.
Small in size and easy to operate.
The whole machine is designed with modular design, and the transmission chamber, vacuum chamber, vacuum pump group, and control power supply are designed in a split manner, which can be adjusted according to the actual needs of users.
Users can choose the power supply according to their actual needs. One power supply can control multiple target guns, or multiple power supplies can control a single target gun.
Technical Specifications
Product Name |
VTC-600GC-AM Continuous Multi Chamber Magnetron Sputtering Coating System |
Product Model |
VTC-600GC-AM |
Main parameters |
1. Structure: Desktop front door structure, rear exhaust system. |
2. Ultimate vacuum: 6.0X10-5Pa。 |
3. Leakage rate: 1h ≤ 0.5Pa. |
4. Extraction time from atmospheric to 5.0X10-3About 5 minutes. |
5. Vacuum pump set: mechanical pump+molecular pump. |
6. Sample stage: diameter 140, room temperature -500 ℃, accuracy ± 1 ℃ (temperature can be increased according to actual needs), rotation adjustable within 5rpm-20rpm. Additional bias voltage function can be selected and installed according to customer needs to achieve higher quality coating. |
7. Gas filling system: 2 mass flow meters. (One argon gas/one nitrogen gas) |
8. The angle between the target head and the axis of the sample stage is 34 ° |
9. Number of targets: 3 (at 120 ° to each other). (More quantities can be customized) |
10. Target gun cooling method: water cooling |
11. Target size: φ 2 ", thickness 0.1-5mm (thickness may vary due to different target materials) |