Welcome Customer !

Membership

Help

Shenyang Kejing Automation Equipment Co., Ltd
Custom manufacturer

Main Products:

instrumentb2b>Products

Shenyang Kejing Automation Equipment Co., Ltd

  • E-mail

    kejing@sykejing.com

  • Phone

    15640436639

  • Address

    Shenyang Kejing Automation Equipment Co., Ltd., International Industrial Park, No. 35-27 Hunnan Middle Road, Hunnan District, Shenyang City

Contact Now

VTC-1HD-ZF2 High Vacuum Magnetron Sputtering Evaporation Coating Instrument

NegotiableUpdate on 12/10
Model
Nature of the Manufacturer
Producers
Product Category
Place of Origin
Overview
VTC-1HD-ZF2 high vacuum magnetron sputtering evaporation coating instrument is a multifunctional high vacuum coating equipment, which includes a single target magnetron sputtering instrument and can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc.
Product Details
Product IntroductionVTC-1HD-ZF2高真空磁控溅射蒸发镀膜仪

VTC-1HD-ZF2 high vacuum magnetron sputtering evaporation coating instrument is a multifunctional high vacuum coating equipment, which includes a single target magnetron sputtering instrument and can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc.

This machine is equipped with one vapor deposition heating boat, which is particularly suitable for vapor deposition of metal films that are sensitive to oxygen (such as Ti, Al, Au, etc.). There is a rotatable baffle above the heating boat; 2 beam source furnace workstations (with 1 beam source furnace as standard); One set of flow meters (one set for argon gas) with a diameter of 150 glass observation window.

Technical SpecificationsVTC-1HD-ZF2高真空磁控溅射蒸发镀膜仪

Product Name

VTC-1HD-ZF2 High Vacuum Magnetron Sputtering Evaporation Coating Instrument

Product Model

VTC-1HD-ZF2

Main parameters

1. Vacuum chamber: φ 324X330

Extreme vacuum 6.0X10-4Pa (using domestic FF-150L turbo molecular pump+mechanical pump)

Leakage rate: 2.0x10-10Pa.m3/s

The material is welded with 304 stainless steel and subjected to electrochemical surface polishing treatment.

Rubber sealing rings are used for sealing in active areas, while copper sealing rings are used for sealing in inactive areas.

The power transmission adopts a magnetic coupling linkage method.

One magnetron target position in the vacuum chamber, one set of evaporation electrodes (two), and two beam source furnace workstations (with one beam source furnace as standard).

One set of flow meters (one set for argon gas) with a diameter of 150 glass observation window and reserved C35 flange interface.

2. Sputtering target head: 2 inches (diameter 50.8mm)

Working vacuum degree: 10Pa~0.2Pa

Target utilization rate:>35% (standard 3mm copper target, target surface vacuum degree 0.5Pa)

MAX功率: <240W(充分冷却)

Insulation voltage:>2000V (with one 500W DC power supply)

3. Resistance evaporation:

Evaporative output voltage: AC 0-8V continuously adjustable

Maximum evaporation current 200A

Ultimate evaporation power < 1.6KW

Temperature is uncontrollable and unmeasurable.

4. Beam source furnace: crucible capacity: 3CC

Heating temperature: room temperature -700 ° C

The heating temperature is measurable, adjustable, and controllable.

Temperature control accuracy: ± 0.5 ° C

Standard quartz crucible with baffle and thermocouple.

Power supply: 500W, 36V

5. Sample stand: φ 120

Temperature control: Room temperature -500 ° C

Rotation speed: 1-20rpm

The sample stage can be manually raised and lowered, with an adjustable upper limit of stroke of 50mm

6. EQ-TM106-1 film thickness gauge

1) Power supply: DC 5V (± 10%), MAX current 400mA

2) Frequency resolution: ± 0.03Hz

3) Film thickness resolution: 0.0136 Å (aluminum)

4) Film thickness accuracy: ± 0.5%, depending on process conditions, especially sensor position, material stress, temperature, and density.

5) Measurement speed: 100ms-1s/time, adjustable

6) Measurement range: 500000 Å (aluminum)

7) Standard sensor crystal: 6MHz

8) Computer interface: RS-232/485 serial interface (baud rates of 1200, 2400, 4800, 9600, 19200, 38400 can be set, data bit: 8, stop bit: 1, checksum: none)

9) Analog output: 8-bit resolution, PWM pulse width modulation output (open collector or internal 5V output)

10) Working environment: Temperature 0-50 ℃, humidity 5% -85% RH, no condensation droplets allowed

11) Dimensions: 90mm × 50mm × 18mm

7. The equipment comes standard with one KJ5000 chiller unit, and the customer should provide their own chiller and deionized or purified water.

8. Whole machine power input: AC220V/50Hz. Power<3.5KW.

9. Product specifications:

Size: Approximately 1300mm × 660mm × 1200mm; Weight: Approximately 160 kg