Thermal atomic layer deposition

Equipment Introduction:

Small desktopALD (Atomic Layer Deposition) tools are designed for simple operation and installation without sacrificingIts naturecan, used forCost effective research and development.

Using semiconductor grade components, metal sealing wires, and powerfulPLC driven user interface for fast cycling and high-quality multi-component films, easy to maintain，Repeatable and safe operation.

Technical Specifications:

·Dimensions L * W * H: 62.3 * 61 * 40cm (4 inches)

·mosttallWendegreecanreach315℃

·goldbelong tosealpipethe Way(Reduce atmospheric pressurefilthdyeofmachinecan)

·3 types of organic metal sources (can be heated to 150 ° C) and 2 types of oxidant/reducing agent sources (with a heat tracing kit that can be heated to 180 ° C),Provide additional co reactant options

·High temperature resistant fast pulse ALD valve, equipped with ultra fast MFC for integrated inert gas purging - standard

·Suitable for 4-inch, 6-inch, and 8-inch substrates, with optional custom chuck fixtures available (large and multi chamber (3 pieces in total)(Available on wafer)

·staticagainstshouldmodelformuladowncanrealnowtallcovercover

·Carrying collectionbecomePLCcontrolof7 inchesapparentshowScreen

·lifetimesoftdocumentriselevel

Available options

·Customized Chuck/Base | Ozone Generator | QCM (Quartz Crystal Microbalance) | Bottle Heating Element

·Design a aerator for your bottle | Upgrade the precursor heating pipeline to 185 ℃ | Integrated glove box connection

·Ventilation precursor shell | Customized shaped cavity | Consultation for customizable system

Equipment advantages

ØThe manufacturer isExperts in the field of ALD

ØHigh quality components (semiconductor grade circuits, valves, metal seals (without water or air intrusion))

ØTrustworthy（PLC control - no need for driver upgrades, no need for additional cards) and reliable (very easy to maintain)

ØIt is designed for laboratory technicians

ØSmall and compact (not taking up space)

ØA small volume chamber means rapid deposition and less precursor waste, as well as deep penetration into three-dimensional structures

ØRapid heating (and cooling) time

ØChemical substances are separated from reactants, so they will not deposit in pipelines, valves, etc....

ØThe length between the precursor and the cavity is short (reducing the chance of line blockage)

ØEasy to operate（150 menus with standard recipe)

Why chooseAnricTechnology???

The world's mainstreamALD manufacturers, such asASM International N.V.， Beneq，PiCoson， Oxford Instruments，TEL and other major companies focus on industrial ALD equipment.

AnricTechnology： Focus on small, mini, desktopALD equipment is easy to operate and easy to maintain, especially suitable for scientific research users.

Developer Introduction:

Philippe of Rouffignac,Ph.Dgraduated fromHarvard University，Department of Chemistry, MentorProf. Roy Gordon, I designed and developed several during my PhD studiesALD equipment and at HarvardCenter for Nanoscale SystemsDuring the period of workincludingDevelopment of CVD/ALD PrefabricatorLater, he came out and foundedAnric TechnologyFocusing on mini and desktop applications for laboratory researchALD。