Compact and economical ALD atomic layer deposition

NegotiableUpdate on 02/06

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Overview

This ALD atomic layer deposition equipment is particularly suitable for small desktop devices used by scientific research users. It is economical, practical, easy to operate, with stable and reliable quality, extremely low after-sales consumables costs, convenient maintenance, and easy to operate. The ALD expert professor laboratory is widely used.

Product Details

Equipment Introduction:
This ALD atomic layer deposition equipment,Small desktop devices particularly suitable for scientific research usersIt is economical, practical, easy to operate, with stable and reliable quality, extremely low after-sales consumables costs, convenient maintenance, and easy to operate. It has been widely used in the laboratory of ALD expert professors.

Introduction to the R&D team:

This device was developed by professors from the renowned ALD team at Harvard, led by Professor Roy G. Grodon.

Academician Roy G. Gordon, Professor Thomas D. Cabot of the Department of Chemistry at Harvard University in the United States. The research field involves applied mathematics, physics, chemistry, and materials science. We have developed effective approximation calculation methods for special functions (Airy, Bessel, Weber, Dawson, Morse, etc.) in the field of applied mathematics, and applied them to fields such as quantum mechanics and chemical kinetics. In the field of physical chemistry, the "Gordon Kim" potential function has been proposed, which can be used to accurately calculate intermolecular interactions. In the field of materials science, since the 1980s, Academician Roy Gordon has been dedicated to researching precursors and processes for chemical vapor deposition (CVD) and atomic layer deposition (ALD), developing a series of precursors that can be used to grow pure metals, metal oxides, nitrides, and sulfides, and applying them to industrial production. The technology method invented by Academician Roy Gordon, which is currently applied in the industrial field, includes: CVD preparation of tin oxide/silicon dioxide multilayer film structure for energy-saving window glass;Rapid ALD preparation of nano Al2O3/SiO2 multilayer films for optical filter devices;ALD preparation of titanium nitride nanofilms for diffusion barriers of copper and aluminum wires in computer chips;Preparation of ITO thin films by CVD for application in thin-film solar cells; CVD preparation of aluminum nitride thin films for application in electroluminescent displays.

Equipment characteristics:

1. The device is small in size and volume,Specially suitable for research on materials with high vacuum and high sensitivityThere are no professional cleanroom requirements, and the smallest model can be directly placed in the glove box for operation. Different forms of connection can also be established with the glove box as needed;

2. The equipment is suitable for scientific research and can accommodate a minimum substrate size of 2 inches;

3. Powder wrapping is possible;

4. It can be done inSelection of on-site upgrade from hot type to plasma type；

5. Sample tables with up to nearly a hundred substrates can be customized according to demand.

If you are interested, please contact us immediately.

User case:

Harvard University, University of Helsinki (birthplace of ALD), Northwestern University, University of Cambridge (UK), Oxford University, Rice University, University of British Columbia (Canada), ENS Paris (France, É cole Normale Sup é rieure), National Institute of Materials Science (Japan, multiple locations), Waseda University (multiple locations), University of Tokyo, Beijing Institute of Quantum Research, Peking University, University of Bristol (UK), University of Sheffield, and more