Powder atomic layer deposition system ALD

Model: AT-200MPlus（plasmaenhance+Thermal atomic layer deposition）

Technical Specifications:

·Dimensions (L * W * H): 35.5 * 38.1 * 56.8cm

·Powder coating optional (capacity up to 10cm ^ 3)

·Can hold samples of 2 inches x 2 inches x 3 inches or two 2-inch discs (customizable chuck and our powder coating option)

·3 precursor ports (1 MFC, 2 cans),6 optional ports(Up to 2 MFCs, 4 tanks), equipped with heat tracing pipelines up to 150 ℃ (HT kit up to 180 ℃)

·Hollow cathode plasma (13.56RF, 80W)

·Ventilation precursor shell

·High temperature resistant fast pulse ALDValves,Equipped with ultra fast MFC for integrated inert gas blowing - standard

·All stainless steel chamber,The temperature range can reach 300 ℃

·High coverage can be achieved in static reaction mode

·5-inch display screen with integrated PLC control

·Including lifelong software upgrades

·1 年保repair

Options: Vacuum pump, 4 ports, Ozone generator (AT-03), Bottle heater, QCM, Remote PC control, ALD precursor, glove box, HT kit (precursor up to 180 ° C), aerator, powder coating machine, heating chuck (up to 450 ° C)

Equipment characteristics:

1. Desktop ALD atomic layer deposition with small footprint;

2. Hot type and upgradable plasma enhancement function；

3. Powder wrapping function can be optionally selected, especially suitable for customers in the field of battery research;

4. The volume is large enough to be directly placed in a glove box for operation, especially suitable for customers in the field of battery research;

5. The operation and installation are extremely simple, making it easy for different personnel in the laboratory to operate experiments.

Application fields:

Specially recommended for applications in the energy sector

1. Application in the field of lithium-ion batteries

Atomic Layer DepositionDue to its conformal deposition and simple and precise film thickness control, ALD has great advantages and application prospects in the encapsulation of nanoscale thin films in nanostructures. Numerous studies have shown that using ALD to encapsulate electrode materials in nanoscale thin films can effectively modify battery materials and improve battery performance. In addition, ALD can also be used to synthesize positive, negative, and solid electrolyte materials for lithium-ion batteries.

2. Application of ALD in the field of solar cells

The application of ALD technology in the field of solar cells mainly includes: ① preparation of nanostructured photoelectrodes; ② Surface modification and passivation of electrodes; ③ Sensitize the electrode surface through quantum dots or metal nanoparticles; ④ Band control of dye-sensitized solar cells and thin-film solar cells.

3. Application of ALD in the field of supercapacitors

ALD technology can not only be used to prepare electrode active materials with high specific capacity, but also to prepare nanostructures, stabilize and improve the performance of electrode materials, and play an important role in the field of high-capacity and highly stable supercapacitorseffect.

4. Application of ALD in the field of fuel cells

ALD has a wide range of applications in the field of fuel cells: high activity catalysts suitable for fuel cells can be obtained by adjusting the composition of metal catalysts (such as bimetallic nanoparticles) and the size of metal nanoparticles; ② Deposition of metal particles on nanostructures to prepare anodes for fuel cells; ③ Preparation of high-performance solid electrolytes to reduce the operating temperature of fuel cells; ④ Forming a protective layer on the electrode surface improves the stability and performance of the battery.

5. Application of ALD in the field of photoelectrochemical water splitting

Due to its growth characteristics, ALD technology can not only prepare photoactive layers, but also deposit performance enhancing or stabilizing layers on photoelectrodes, solving some problems in the field of water splitting in photoelectrochemical cells.