RF magnetron sputtering coating instrument

NegotiableUpdate on 01/27

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

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Overview

The GVC-1000 RF magnetron sputtering coating instrument is mainly suitable for scanning electron microscopy coating conductive films. The instrument is easy to operate and is a necessary instrument for sample preparation. Applicable target materials: gold, platinum, gold palladium alloy, silver, lead, copper, chromium, antimony, etc!

Product Details

The GVC-1000 RF magnetron sputtering coating instrument (fully automatic ion sputtering instrument) is mainly suitable for scanning electron microscopy coating conductive films. The instrument is easy to operate and is a necessary instrument for sample preparation. Applicable target materials: gold, platinum, gold palladium alloy, silver, lead, copper, chromium, antimony, etc!

description

1. Working principle of ion sputtering instrument: magnetron sputtering;

2. Optional target materials: gold, platinum, gold palladium alloy, lead, silver, copper, chromium, antimony, etc;

3. Vacuum chamber: 128 × 100 high silicon boron glass;

4. Fully automatic operation, simple and easy to use, very suitable for tungsten filament, desktop scanning electron microscope, etc;

Automatic adjustment of sputtering current - After setting the sputtering current, the system automatically adjusts the vacuum degree to achieve the set sputtering current. The adjustment time is less than 5 seconds and the fluctuation range is less than ± 5%;

5. No need to press the "experiment" button to adjust the sputtering current, no need to operate the "intake valve":

(1) Automatic memory of sputtering time - set once for similar samples;

(2) Automatic parameter adjustment - During the sputtering process, the sputtering current and duration can be adjusted at any time, and the system automatically calculates the superposition without terminating the sputtering process;

(3) Automatic deflation upon completion of work;

(4) The height adjustment of the sample stage is completed in 1 second;

(5) The sputtering process can be displayed using curves, which are clear and intuitive;

(6) Extreme vacuum: less than 1Pa;

6. Software and hardware interlocking, anti misoperation, safe and reliable:

(1) Vacuum degree higher than 100Pa, activate vacuum protection, unable to sputter;

(2) Stop the sputtering process when the sputtering current exceeds 50mA;

(3) When the vacuum pump is working, the system cannot perform deflation operation;

7. The GVC-1000 RF magnetron sputtering coating instrument has uniform coating and good conductivity.

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