GVC-2000T High Vacuum Magnetron Ion Sputtering Instrument

NegotiableUpdate on 01/27

Model

Nature of the Manufacturer: Producers

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Place of Origin

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Overview

The GVC-2000T high vacuum magnetron ion sputtering instrument is an easy to operate magnetron ion sputtering instrument, providing the best practical value for automated coating machines on the market. It is used for the preparation and processing of non-conductive samples to improve the resolution of 3D imaging screens, reduce sample conductivity and electronic charge, and minimize light damage to more sensitive samples.

Product Details

高真空磁控离子溅射仪

GVC-2000T High Vacuum Magnetron Ion Sputtering InstrumentIt is an easy to operate magnetron ion sputtering instrument, providing the best value product on the market for automated technology coating machines. It is used for the preparation and processing of non-conductive samples to improve the resolution of 3D imaging screens, reduce sample conductivity and electronic charge, and minimize light damage to more sensitive samples.

1、 Description

1. Fully automated knowledge products;

2. No thermal damage, higher efficiency, finer particle size, more suitable for high-resolution electron microscopy.

2、 Basic principles

Equipment for coating conductive raw materials (such as Pt Pd, Pt, Au, and Pd) onto the surface of the sample. In addition, non-conductive samples are used for data visualization under transmission electron microscopy, as well as to protect the sample surface from the harm of introducing ion beams and to assist in the fluidity of electronic devices. They can even be used as plastic film type electricity generators.

3、 Application Fields

1. Preparation of high-resolution scanning electron microscopy samples (actual magnification ≥ 100K);

2. Electrode Preparation - Various metal electrodes and ITO electrodes can be prepared.

4、 Equipment configuration and technical parameters

model&name	GVC-2000T High Vacuum Magnetron Ion Sputtering Instrument
vacuum system	Turbomolecular pump (imported): German Leybold 90i (single magnetic levitation molecular pump, pumping speed of 90L/s) Rotary vane vacuum pump: Zhejiang Feiyue VRD-4 (pumping speed of 1.1L/s)
Vacuum measurement	Full range composite vacuum gauge (imported): 1.0E5Pa-1E-4Pa
System ultimate vacuum	≤5E-3Pa
Sputtering power supply	Magnetron sputtering power supply, power 150W
Available target materials	All metal targets, ITO targets
Sputtering voltage	300-600V, Change according to the selection of target material and control parameters
Sputtering current	0-200mA continuously adjustable, step size 5mA
sputtering time	0-9999s, Continuously adjustable step size of 1 second
operating interface	7-inch TFT color LCD touch screen with a resolution of 800 × 480
Operation method	One-click operation
Extraction rhythm	<15 minutes
Control method	Just set the sputtering current and time, fully automatic control Equipped with pre sputtering baffle (pre sputtering time can be set), fully automatic control
protection function	Software and hardware interlocking, preventing misoperation, equipped with current and vacuum protection, etc
Sample table diameter	φ125mm， Self rotating, automatic and manual control, adjustable speed of 4-40rpm
Vacuum chamber	High silicon boron glass, with a specification size of approximately φ 200 × 130mm
power supply	220V 50Hz power 800W
Size&Weight	Weight 424 (length) x 345 (depth) x 420mm (height), 25 kg (net weight)
cooling method	Internal air cooling
optional	Sample stage selection, film thickness control, temperature monitoring, etc