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E-mail
27518410@qq.com
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Phone
18611817232
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Room 1209, Block D, Junfeng Huating, No. 69 Beichen West Road, Chaoyang District, Beijing
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Beijing Gewei Instrument Co., Ltd
High vacuum magnetron ion sputtering instrument
NegotiableUpdate on 01/27
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Overview
The GVC-2000TD high vacuum magnetron ion sputtering instrument can prepare various metal, elemental, and inorganic non-metallic thin films; Multi layer composite film preparation can be achieved without breaking the vacuum.
Product Details
1、 Advantages of GVC-2000TD High Vacuum Magnetron Ion Sputtering Instrument:
1. Can prepare various metal, elemental, inorganic non-metallic thin films;
2. Multi layer composite film preparation can be achieved without breaking the vacuum;
3. One click operation, fully automatic control, high degree of intelligence;
4. Good consistency and repeatability;
5. Built in multiple target material working parameters, no need to explore coating processes;
6. Small size, compact structure, very space saving.
2、 GVC-2000TD High Vacuum Magnetron Ion Sputtering Instrument Product Parameters:
| External dimensions (host) | 424(L)×345(D)×420(H) | input power | 220V/50Hz 1000W |
| Sputtering target head 1 | dc magnetron sputtering | Available target materials | Metal target material |
| Sputtering target head 2 | RF magnetron sputtering | Available target materials | Inorganic non-metallic target material |
| vacuum system | Turbo molecular pump+Rotary vane vacuum pump | pumping speed | 90L/s + 1.1L/s |
| Vacuum measurement | Composite vacuum gauge | measurement range | 1E-3 ~ 1E5Pa |
| Vacuum chamber | φ 200×130mm borosilicate glass | Extraction rhythm | 10 Minutes（≤5E-3Pa） |
| Sample stage size | φ 90mm | Sample stage switching | automatic control |
| Sputtering target size | φ 57mm(Thickness) 0.1-2mm） | Working vacuum | 0.1-2Pa |
| operating interface | 7 inch TFT Touchscreen LCD screen | operating language | Chinese (optional for other languages) |
| chiller | Small desktop refrigeration machine | Chiller power | 180W |
| Pre sputtering baffle | Standard fully automatic control pre sputtering baffle | ||
| Film thickness gauge (optional) | Real time display of coating thickness and control of coating process through settings, measurement accuracy 0.01nmSet accuracy 0.1nmSingle setting range 1-999nm | ||
| Temperature control component (optional) | Sample stage heating module 300℃/500℃ | ||
| Rotating component (optional) | Tilt rotation, planetary rotation, etc | ||
| Small car (optional) | Assemble the host, RF power supply, chiller, etc. together, with good overall integrity | ||
| Installation environment | 220V/10A One three hole socket, purity 4N High purity argon gas above (outlet pressure) 0.12MPa） | ||
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