Magnetron ion sputtering instrument

GVC-2000PMagnetron ion sputtering instrumentProduct Features:
1. One click operation with work completion prompt sound.
2. The coating particles are small and there is no thermal damage.
3. The replacement of target material is very simple.
4. Special sealing structure, glass is not easily damaged.
5. Built in operation guide, proficient in operation without training.

Gold particle size (silicon wafer sprayed with gold) battery separator 100000 times (platinum sprayed)

GVC-2000PMagnetron ion sputtering instrumentTechnical Solution

1. Use a planar magnetron sputtering target head for target sputtering to ensure that the sample does not suffer thermal damage during the working process.

2. Using ARM as the processor, fully independent intellectual property rights, good scalability, optional:

a) Film thickness monitoring component: can preset the desired coating thickness and accurately control the coating thickness during operation;

b) Sample stage heating component: can improve the density of the film layer and the bonding strength with the base by heating.

3. 7-inch touch screen LCD display with a resolution of 800 × 480 and full digital display;

3.1 Can be set: (1) Sputtering current; (2) Sputtering time; (3) Types of target materials; (4) Work vacuum degree; (5) Working gas; (6) Screen brightness and other parameters;

3.2 Can display: (1) Sputtering current; (2) Remaining sputtering time; (3) Work vacuum degree; (4) Accumulated usage time of target material; (5) Accumulated usage time and other parameters of the device.

4. Sputtering current: 2-100mA continuously adjustable, with a minimum step size of 1mA;

5. Sputtering duration: 1-999s continuously adjustable, with a minimum step size of 1s；

6. Sputtering vacuum: 4-20Pa continuously adjustable, with a minimum step size of 0.1Pa；

7. Sputtering target material: High purity platinum target (purity 4N9) is standard, with a specification of φ 57 × 0.12mm; gold, silver, copper, gold palladium alloy and other metals can also be used as sputtering targets;

8. Vacuum chamber: made of high transparency high silicon boron glass, with a size of approximately φ 200 × 130mm;

9. Sample stage: a stainless steel sample stage that can rotate on its own, with a diameter of 125mm and an adjustable speed of 4-20rpm;

10. Target material parameters: The system provides working parameters for gold, platinum, silver, and copper for air and argon gas, which can be directly used. Simultaneously providing 4 types of custom target materials, users can set working parameters according to their own needs;

11. Pre sputtering: Equipped with a fully automatic pre sputtering baffle to ensure stable and reliable operation process;

12. One click operation: The system can automatically complete the processes of air extraction, inflation, parameter adjustment, pre sputtering, sputtering coating, etc; After sputtering is completed, turn off the vacuum pump and the system will automatically inflate to balance the pressure inside and outside the vacuum chamber;

13. Equipped with dual interlocking of sputtering current and vacuum degree, it is safe and reliable. When any condition is triggered, the system can stop working to prevent equipment damage caused by misoperation;

14. The system uses Pirani vacuum gauge as the vacuum measuring element;

15. The ultimate vacuum is better than 1Pa, and the vacuum pump pumping speed is 1.1L/s;

16. It has the function of real-time curve display of sputtering current and vacuum degree, which is very convenient for users to understand the working status of the system;

17. Adopting a professional target material replacement structure, rapid replacement of target materials can be achieved without the need for any tools;

18. Instrument power supply: AC220 ± 10% V, rated power 500W.