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Beijing Gewei Instrument Co., Ltd

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    27518410@qq.com

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    18611817232

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    Room 1209, Block D, Junfeng Huating, No. 69 Beichen West Road, Chaoyang District, Beijing

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GVC-2000 Magnetron Ion Sputtering Instrument

NegotiableUpdate on 01/27
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Overview
The GVC-2000 magnetron ion sputtering instrument has smaller particles and is more suitable for high magnification image observation, and is suitable for field emission/high-resolution field emission electron microscopy.
Product Details
GVC-2000 Magnetron Ion Sputtering Instrumentdescription
  1. There is basically no temperature rise and no heat loss on the sample surface.

GVC-2000磁控离子溅射仪 GVC-2000磁控离子溅射仪

GVC-2000 Sample Preparation Rendering Other Sample Preparation Equipment Rendering

The above two images are electron microscopy images of filter membrane samples. The left image is the electron microscopy observation image of GVC-2000 after gold spraying, which shows that the sample morphology is true and complete. The right image is the electron microscopy observation image of other equipment after gold spraying, which shows that the thermal damage is severe and it is almost impossible to identify it as the same type of sample.

  1. Smaller particles, more suitable for high magnification image observation, suitable for field emission/high-resolution field emission electron microscopy.

GVC-2000磁控离子溅射仪 GVC-2000磁控离子溅射仪

Gold particle size: 6-10nm

GVC-2000磁控离子溅射仪 GVC-2000磁控离子溅射仪

Ceramic membrane, coating material Pt, 100000 times image, no particle sensation filter membrane material, coating material Pt, 200000 times image, no particle sensation.

  1. GVC-2000 Magnetron Ion Sputtering InstrumentLow voltage high current sputtering for higher efficiency.