PIE EM-KLEEN remote plasma cleaning instrument from the United States

Remote plasma cleaning instrument

be used forSEM,FIB,TEM,XPS,ALD,CD-SEM,EBR,EBI,EUVLRemote plasma cleaning equipment with other high vacuum systems.The remote plasma source needs to be installed on the vacuum chamber to be cleaned, and the controller provides RF energy to the remote ion source. Radio frequency electromagnetic fields can excite plasma, decompose input gases, and generate active radicals of oxygen or hydrogen. The active radicals will diffuse to downstream vacuum chambers and undergo chemical reactions with pollutants inside, and the reaction products can be easily extracted. The remote plasma cleaner can clean both the vacuum system and the sample simultaneously!

Remote plasma cleaning instrumentThe series has three models:

1）EM-KLEEN A modelintelligenceDesign and functionalityPowerful downstreamtypeplasmaCleaning device.

2）SEMI-KLEEN quartzDesigned to meet the stringent cleaning requirements of the semiconductor industry

ofSolution.

3）SEMI-KLEEN sapphireUsed for decontamination and cleaning in the semiconductor industry, and supports durability

Corrosive gas plasmaApplication.

Instrument features:

• Quickly clean contaminated itemsSEMSample.2-60Hydrogen plasma cleaning in secondsALDSample.

No need to slow down or shut down the turbo molecular pump

• Low plasma bias design reduces ion sputtering and particle generation. Combining multiple levels of proprietary patents

Gas filtration technology,SEMI-KLEENCan meet the most demanding particle pollution removal requirements of users

• Optional sapphire tube cavity and corrosion-resistant gas flow controller to supportCF4, NF3, NH3, HF, H2SWaiting for applications

• The unique plasma intensity sensor can monitor the plasma state in real-time, allowing users to have a clear understanding of the plasma state at a glance

• Automatic electronic flow controller based on pressure sensing feedback control, without manual adjustment of needle valve

• Intuitive touchscreen operation, customizable60Cleaning program plan

• Having intelligent security operation mode and expert control mode;SmartSchedule^TMTiming device, which detects the number of sample loading times or time intervals to schedule the cleaning system

• Low electromagnetic interference design, quiet standby mode

Recommended application:

• FE-SEM、FIBandTEMCleaning of in-situ samples

•Suitable for semiconductor equipment, such asCD-SEM, EBR, EBI, EUVLetc.

•High vacuum chamber cleaning to remove hydrocarbons and fluorocarbon pollutants

•Reduce ultra-high vacuum(EHV)And ultra-high vacuum(UHV)Pump shutdown time

•Applicable toXPS、SIMS、AESCleaning of chambers and samples with atomic probes

•Applicable toALDCleaning of chambers and samples with other semiconductor processing equipment

PIE ScientificDeveloped bySmartClean™ Technology combines with nuclear research

The most advanced plasma discharge technology in the semiconductor industry.EM-KLEEN

andSEMI-KLEENPlasma cleaning equipment compared to previous generations of plasma cleaning equipment

Much more advanced. Our plasma cleaner can meet any technical specifications

Better than others; In addition, many unique features are only available in our instruments

Only owned on the product.

We also offer other seriesSample cleaning, sample rod cleaning, and storage should be carried out

useThe instrument，If you need,Please refer toTergeoSeries

Multipurpose ChamberandTEM holder storage.