MKS Revolution RPS AX7690 Remote Plasma Source

MKS Revolution RPS AX7690 Remote Plasma SourceProvide high-performance and clean reactive gas sources required for semiconductor wafer processing.The innovative R * evolution is a product in a new series of remote plasma sources specifically designed for "onwafer" applications. It combines MKS's field validated low field annular plasma technology with *'s plasma applicator design to produce ultra clean atomic neutral particles or radicals.

Atomic radicals are crucial in many processes, such as photoresist removal, wafer pre cleaning, and thin film nitriding and oxidation.Free radicals are usually generated by the production of plasma.However, charged particles are sometimes unwelcome.To avoid these adverse effects, plasma is generated externally and free radicals are effectively transported to the processing chamber.

MKS Revolution RPS AX7690 Remote Plasma SourceThe reaction gas generator integrates the quartz vacuum chamber, RF power supply, and all necessary control devices into a compact, independent unit for easy operationDirectly installed on the processing room of the tool.The result is to obtain an extremely clean source of atomic radicals, which can generate the required reactions on the wafer while greatly reducing complexity.The R * evolution remote plasma source can provide up to 6 kW of plasma power, providing a high free radical flow rate (up to 5 slm) for the process, resulting in a stripping or etching rate that is twice as fast as traditional microwave systems.Due to its high efficiency and low cost, R * evolution remote plasma sources can significantly reduce overall investment and tool operating costs.In addition, its smaller size and simple design make it easy for users to install, operate, and maintain.