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Jiangsu Shenzhou Semiconductor Technology Co., Ltd

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    No. 19 Shugang West Road, Hanjiang District, Yangzhou City, Jiangsu Province

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MKS ASTRON2L RPS Semiconductor Remote Plasma Source

NegotiableUpdate on 05/15
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Overview

The MKS ASTRON2L RPS semiconductor remote plasma source is a key component in the semiconductor production line deposition and etching chamber cleaning process, which can eliminate the accumulation of process by-products from the chamber wall, increase the lifespan of process tools, and reduce the source of film contamination.

Product Details

MKS ASTRON2L RPS Semiconductor Remote Plasma SourceIt is a high-performance remote plasma source with excellent performance and high reliability that has been verified for a long time. It is a key sub component of the deposition and etching chamber cleaning process, eliminating the accumulation of process by-products from the chamber wall, increasing the lifespan of process tools, and reducing the source of film contamination.ASTRON Series RPS is widely used in the cleaning process of various semiconductor processes,It can be installed in various configurations on silicon wafers or large-area substrate process chambers. ASTRON Series RPS has good performance and is more economical and reliable, providing the required reaction gas chamber cleaning for CVD chamber cleaning, FPD (flat panel display), solar chamber cleaning, photoresist stacking, oxidation, nitriding, and chemical reduction.

MKS ASTRON2L RPS Semiconductor Remote Plasma SourceTechnical Specifications

Equipment model: Astron AX7657-85,P/N 0190-41326W

AC input: 208V~, 3 phases~, 50/60Hz, 30A

Heat dissipation method: water-cooled heat dissipation

Water cooling pressure: 100 PSIG (Max.)

Communication interface: RS-232/Cust I/O

MKS ASTRON2L RPS 半导体远程等离子源

MKS ASTRON2L RPS 半导体远程等离子源