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Saifei Scientific Instruments (Suzhou) Co., Ltd
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Saifei Scientific Instruments (Suzhou) Co., Ltd

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    michael.han@sypht.com.cn

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    Wujiang District Science and Technology Innovation Park, Suzhou City, Jiangsu Province

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JEOL cross-section polishing equipment for sample preparation in Japan

NegotiableUpdate on 01/30
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Overview
In order to meet the diverse needs of the market, the IB-19530CP section polishing instrument from Japan Electronics JEOL adopts a multi-purpose sample stage and achieves functional diversification by exchanging various functional sample holders.
Product Details

JEOL cross-section polishing equipment for sample preparation in JapanIn order to meet the diverse needs of the market, a multi-purpose sample stand is adopted, which achieves functional diversification by exchanging various functional sample holders.

  Sectional polishing instrumentAccording to the needs, different functional sample holders can be selected, which can not only perform cross-sectional etching, but also planar etching, ion beam sputtering coating, etc.

High throughput etching can be achieved in a short period of time without waiting for processing to begin, by equipping with a high-speed ion source and utilizing automatic start processing function.

The automatic processing program can be programmed for fast processing and precision polishing, and high-quality cross-sections can be prepared in a short period of time. In addition, using the intermittent processing mode can also suppress the processing temperature.

◇ The simple functional sample holder adopts modular design, and the processing position can also be adjusted under an optical microscope (sold separately).

The multi-purpose sample stage can not only perform cross-sectional etching, but also planar etching, ion beam sputtering coating, etc. by selecting various functional sample holders.

The durability of the high durability shading board is about three times that of the old model, and it can support high-speed processing and long-term etching.

Main technical indicators

Ion acceleration voltage 2~8kV
etch rate 500μm/h
Maximum size for carrying samples 11mm (width) x 10mm (length) x 2mm (thickness)
Sample swinging function During the etching process, the sample automatically swings ± 30 ° (No. 4577130)
Automatic processing start mode After reaching the set pressure value, processing can automatically begin.
Intermittent processing mode Pulse controlled ion beam irradiation can suppress the heat generated during processing.
Precision polishing processing mode After the main processing is completed, the precision polishing process will automatically begin.