PLUTO-MH domestic plasma etching machine is an innovative experimental platform developed for universities, scientific research institutes, enterprise laboratories, or innovative enterprises engaged in small-scale production. We provide different functional accessories to meet the different needs of users, which not only achieve conventional performance, but also have various capabilities such as surface coating (coating), etching, plasma chemical reaction, powder plasma treatment, etc.

PLUTO-MH domestic plasma etching machineFeatures:
1. For use in situations with strict requirements for plasma treatment
2. The plasma source uses a radio frequency generator with a frequency of 13.56MHz, which takes into account both physical and chemical reactions
3. Equipped with a 500W power supply, automatic impedance matching, and a high-power RF generator capable of meeting various experimental requirements, ensuring high energy density and processing efficiency
4. High precision vacuum control to meet various processing requirements
5.316 stainless steel chamber (or 6061 aluminum alloy), all stainless steel pipelines and connectors, suitable for various gases (including corrosive gases)
6.4.3-inch industrial grade touch screen, easy software operation, multiple parameter settings and process combination processing modes
7. Multiple accessories can be added, including coating and coating, electrode temperature control, plasma intensity control, plasma chemical reaction, and other functions (please consult sales personnel for special applications)
8. Provide corresponding plasma treatment solutions and customized special purpose equipment according to user needs
PLUTO-MH domestic plasma etching machineparameter
Vacuum chamber specification: 316 stainless steel chamber, diameter 210mm * (depth) 230mm, approximately 4L
Electrode: Two adaptive flat electrodes, made of T6061 aluminum alloy (available with PTFE coated non porous flat electrodes, suitable for samples requiring double-sided processing)
Electrode size: 120 * 135mm with adjustable spacing of 20-75mm (reversible)
Plasma generator: RF radio frequency generator, frequency: 13.56MHz
Power: 0-500W continuously adjustable, automatic impedance matching, accuracy of 1W
Gas control: Needle type gas flow valve, equipped with 1-way gas, all stainless steel pipes and connectors as standard
Control mode: 4.3-inch industrial control touch screen
Control software function: The interface displays real-time working status,
It can display the set value and actual value for real-time control.
Free setting of plasma power and gas injection time
Multi level operation permissions, combined control of multiple process parameters,
Fully manual control and fully automatic control are optional
Protection device: One click emergency stop protection button
(If you need other functions, please consult the sales staff)
PLUTO-MH domestic plasma etching machineApplication areas:
Configure different modules to expand different applications
Heating electrode module - temperature controllable, can accelerate plasma processing speed and greatly improve sample processing uniformity
Deposition coating module, changing surface characteristics:
Deposition of CF material, the sample surface can have hydrophobic properties
Depositing materials containing benzene, the sample surface exhibits insulation and waterproofing properties
Deposition of materials containing hydroxyl groups to improve the bonding effect between the sample surface and other materials
Inductive coupling module - Inductive coupling plasma device
Gas mixing device
Mixing design can be carried out according to specific requirements
Gas purification and reaction
Gas purification and chemical reactions using plasma and related materials