Desktop atomic layer deposition system ALD

Model:AT-200M (Thermal Atomic Layer Deposition System)

The smallest atomic layer deposition system on the marketALD

An economical atomic layer deposition system suitable for scientific researchALD

An affordable atomic layer deposition systemALD

Can be made into powderAtomic layer deposition systemALD

An atomic layer deposition system that can be placed in a glove boxALD

Especially suitable for use in high vacuum and extremely low water oxygen environments

Technical Specifications:

·rulerinch(L*W*H):35.5*38.1*56.8cm

·Powder coating optional (capacity up to~10cm ^ 3)

·Can hold 2-inch x 2-inch x 3-inch or two 2-inch discsSamples (customizable chuck and our powder coating options)

·2Previouslydrivebodyend口，4acanselectend口(Equipped with a heat tracing line up to 150 ° C, HT kit up to 180 ° C)

·Upgradeable to hollow cathode plasma (optional) ventilated precursor shell

·High temperature resistant fast pulse ALD valve equipped with ultrafast MFC for integrated inertingSexual gas blowing - standard configuration

·All stainless steel chamber，The temperature range can reach 300 ° C

·High coverage can be achieved in static reaction mode

·5-inch display screen with integrated PLC control

·Including lifelong software upgrades

·1Annual warranty

Optional: Vacuum pump, 4 ports, ozone generator(AT-03), Bottle heater, QCM, Remote PC control,ALD precursor, glove box, HT kit (precursor to)180 ℃), aerator, powder sprayer, HC plasmabody.

typical user:

thatALD equipment customers are located all over the world, including international experts in the ALD industry who are renowned members of the ALD Conference Committee

Sean Barry, Dennis Haussman, Mikko Ritala，Anjana Devi，Stacey Brentwait

among whichMikko RitalaPublish a lot every yearThe article on ALD comes from the birthplace of ALD, the University of Helsinki

For more details, please contact us for consultation.

ourALD Consulting Services

Thin film deposition service

We can deposit various materials on your sample.

Process problem resolution service

We can provide extensive technical support for thin film and nanotechnology processes, process integration, and device performance. When there is a need, we will provide reports and recommendations based on employees' rich experience, in-depth literature research, theoretical modeling, and direct experiments.

Although our expertise lies in atomic layer deposition technology(ALD)， But we have also been involved in multiple projects, which typically fall within the scope of semiconductor processing and nanotechnology research and development.

We have developed new devices for startups and new materials for university laboratories and some large enterprises.

Market analysis and technical evaluation

We can provide in-depth analysis of the application trends of a specific atomic layer deposition technology in the market for enterprises and academia in related fields, while also evaluating the current research and development status of existing and emerging atomic layer deposition related sciences.