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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China
Product Categories
- Z-series stereomicroscope Leica Z6 APO
- F30 online film thickness tester
- F60 Fully Automatic Film Thickness Tester
- Diener NANO plasma cleaning machine
- Vista-IR High Resolution Nanoinfrared Imaging and Spectroscopy System
- LF-2000 Integrated In Situ Nanomanipulation Machine
- 6-inch nanoimprint machine NIL-150
- Passive isolation table GWA-TM
- High precision nano stretching system Nano UTM T150
- RSA5000 series spectrum analyzer
- TTR500 Series Vector Network Analyzer (VNA)
- MTA02 Micro Force Displacement Test Control System
- PA1000 power analyzer
- TS2000 automatic probe station
- TS200 8-inch manual probe station
- F3 Single Point Film Thickness Tester
- Candela CS920 Surface Defect Detector
- P170 fully automatic wafer probe profilometer/stair step meter
- NX Hivac High Vacuum Atomic Force Microscope
- NX-PTR fully automatic online detection atomic force microscope
- NX-HDM fully automatic defect detection atomic force microscope
- P17 automatic wafer probe profilometer/stair step meter
- NX Wafer Fully Automated Wafer Inspection Atomic Force Microscope
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- Nano observer electrical atomic force microscope
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- DV-502 Thermal Evaporation Thin Film Deposition
- Desktop Pro Thin Film Deposition - Magnetron Sputtering
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- proximity aligner
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- COWIN High Throughput Integrated Plasma Reaction Ion Etching Cleaning System
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- Co series desktop plasma etching machine cleaning machine
- CLONE dual-mode plasma etching machine cleaning machine
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- In SEM HT high-temperature in-situ nanoindentation instrument
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- High temperature in-situ nanoindentation instrument
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- Active isolation table ARISMD
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- Passive isolation table GWA-TO
- Active isolation table PMT
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- S series stereomicroscope
- Leica M Series Stereoscopic Microscope LeicaM125/165C/205C/205A
- DM750P professional polarizing microscope
- EUV/X-ray reflector
- X-ray Fresnel zone plate (FZP)
- Grating template
- MPI Titan RF Accessories
- GGB microwave probe
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- Leica room temperature ultra-thin slicer Leica EM UC7
- Film thickness measuring instrument
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- Established Active Vibration Isolation Platform
- BI-4500 high-throughput fully automatic surface plasmon resonance analyzer
- TS150-HP high-power probe station
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- MVI scattering scanning near-field optical microscope
- TS150 6-inch manual probe station
- 4200A-SCS parameter analyzer
- F40 Microscopic Film Thickness Measuring Instrument
- Zeta20 multi-mode 3D optical profilometer
Shanghai Nateng Instrument Co., Ltd
X-ray Fresnel zone plate (FZP)
NegotiableUpdate on 01/24
- Model
- Nature of the Manufacturer
- Producers
- Product Category
- Place of Origin
Overview
X-ray Fresnel zone plate (FZP)
Product Details
NTT'sFZPEtched by dry methodTaform. Has excellent high durabilityXRadiation radiation, high resolution and high contrast, clear absorber patterns,S/NHigh ratio, less imaging defects,Can be ideally applied toXX-ray microscopeXRadiation and Microbeam RadiationXRadiographic imaging.
In addition, it also provides software forXRadiation and extreme ultraviolet（EUV、XUV）In the fieldTaPattern/SiNMembrane typeFZPandAuBoard pattern/SiNMembrane typeFZPAnd provide a stepped (Kino hologram)FZP
model |
Aspect ratio |
Membrane material |
Film thickness （μm） |
ΔRn （nm） |
D （μm） |
N |
Tm （nm） |
FZP-S38/84 |
4.2 |
SiN |
0.15 |
38 |
84 |
550 |
160 |
FZP-S50/80 |
5 |
SiN |
0.2 |
50 |
80 |
400 |
250 |
FZP-S40/155 |
5 |
SiN |
2 |
40 |
155 |
970 |
200 |
FZP-S50/330 |
8 |
SiN |
1 |
50 |
330 |
1,650 |
400 |
FZP-S86/416 |
8 |
SiN |
2 |
86 |
416 |
1,200 |
700 |
FZP-100/155 |
8 |
SiN |
2 |
100 |
155 |
388 |
800 |
FZP-173/208 |
5.8 |
SiN |
2 |
173 |
208 |
300 |
1,000 |
FZP-200/206 |
8 |
SiN |
2 |
200 |
206 |
255 |
1,600 |
FZP-C234/2500 |
0.6 |
SiC |
0.2 |
234 |
2,500 |
2,670 |
150 |
NTT-AT's EUV-FZP has been optimized for EUV wavelengths.
Ta absorbent pattern on thin film achieves below 100nm/a
Minority 100 nanometer focusing and imaging, etc
-EUV microscope
-EUV Nanobeam Generation
-Ultra fine EUV inspectionSimilar Product Recommend
