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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China
Product Categories
- Z-series stereomicroscope Leica Z6 APO
- F30 online film thickness tester
- F60 Fully Automatic Film Thickness Tester
- Diener NANO plasma cleaning machine
- Vista-IR High Resolution Nanoinfrared Imaging and Spectroscopy System
- LF-2000 Integrated In Situ Nanomanipulation Machine
- 6-inch nanoimprint machine NIL-150
- Passive isolation table GWA-TM
- High precision nano stretching system Nano UTM T150
- RSA5000 series spectrum analyzer
- TTR500 Series Vector Network Analyzer (VNA)
- MTA02 Micro Force Displacement Test Control System
- PA1000 power analyzer
- TS2000 automatic probe station
- TS200 8-inch manual probe station
- F3 Single Point Film Thickness Tester
- Candela CS920 Surface Defect Detector
- P170 fully automatic wafer probe profilometer/stair step meter
- NX Hivac High Vacuum Atomic Force Microscope
- NX-PTR fully automatic online detection atomic force microscope
- NX-HDM fully automatic defect detection atomic force microscope
- P17 automatic wafer probe profilometer/stair step meter
- NX Wafer Fully Automated Wafer Inspection Atomic Force Microscope
- NX-3DM Rotating Fully Automatic Atomic Force Microscope
- Nano observer electrical atomic force microscope
- EM-AFM electron microscope in situ atomic force microscope
- Cathodic Fluorescence Imaging Spectral Detection System
- SERS chip substrate
- Multi functional maskless laser direct writing
- Optical surface defect analyzer
- Maskless laser direct writing
- Explorer Electron Beam, Magnetron, Thermal Evaporation Thin Film Deposition
- DV-502 Thermal Evaporation Thin Film Deposition
- Desktop Pro Thin Film Deposition - Magnetron Sputtering
- BenchTop Turbo Thermal Evaporation and Sample Preparation
- Desk V Thin Film Deposition Solution
- Hyperspectral microscope
- Freeform Surface 3D Shape Tester
- Wafer warpage stress measuring instrument
- Internal stress detector
- Semi automatic wafer bonding machine
- proximity aligner
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- Atomic layer deposition system ALD products
- Electron microscope sample cleaning machine
- CMP20 electrochemical mechanical polishing machine
- Laser interference lithography machine
- VITA reactive ion etching machine (vertical chamber)
- COWIN High Throughput Integrated Plasma Reaction Ion Etching Cleaning System
- LAVIDA Paraxylene Coating Equipment
- Co series desktop plasma etching machine cleaning machine
- CLONE dual-mode plasma etching machine cleaning machine
- Liquid particle size analyzer
- EzAFM portable atomic force microscope
- Laser sampling
- Precision glass cutting machine (desktop type)
- ADR low-temperature constant temperature dry mK system
- Liquid Particle Sizer - LPC
- High temperature 3D printer
- Block resistance tester
- S100 type digital source table
- NX12 Biological Atomic Force Microscope
- Zeta-388 automatic multi-mode optical profilometer
- TS200-HP high-power probe station
- Zeta-300 multi-mode optical profilometer
- TS2000-DP high-power probe station
- TS50 manual small probe station
- TS2500-RF Fully Automatic RF Probe Station
- TS3000 automatic probe station
- MicroXAM800 White Light Interferometer
- TS300 12 inch manual probe station
- MDO34 oscilloscope
- In situ AFM in SEM
- Pulse laser deposition system (PLD)
- Active Vibration Isolation Platform AMT
- Duramin-100 hardness tester
- 3-inch nanoimprint machine NIL75
- In situ automatic nanomanipulation system
- In situ MEMS chips and synchrotron radiation holders
- In SEM HT high-temperature in-situ nanoindentation instrument
- Duramin-4 hardness tester
- High temperature in-situ nanoindentation instrument
- Active isolation table ARISTT
- Active isolation table ARISMD
- Passive vibration isolation SOTOT
- Passive isolation table GWA-M
- Passive isolation table GWA-TO
- Active isolation table PMT
- Diener Pico plasma cleaning machine
- Diener FEMTO plasma cleaning machine
- FT-NMT04 Nano Mechanical Performance Testing System
- ACCUTOM-10/-100 cutting equipment
- X1 series digital adjustable drying cabinet
- EZ series stereomicroscope
- DM 4500P semi-automatic intelligent digital polarizing microscope
- Leica M Series Stereoscopic Microscope LeicaM165FC/205FA
- S series stereomicroscope
- Leica M Series Stereoscopic Microscope LeicaM125/165C/205C/205A
- DM750P professional polarizing microscope
- EUV/X-ray reflector
- X-ray Fresnel zone plate (FZP)
- Grating template
- MPI Titan RF Accessories
- GGB microwave probe
- Quantifoil porous mesh carrier
- GGB calibration standard sample
- Customized vibration isolation system
- Ion beam etching/deposition system
- Silicon nitride thin film window
- AFM substrate
- AFM probe
- MPI RF calibration substrate
- GGB active high impedance needle tip
- GGB DC probe
- Hole shaped template
- Prism coupler
- Duramin-40 hardness tester
- 4-inch nanoimprint machine NIL-100
- Leica room temperature ultra-thin slicer Leica EM UC7
- Film thickness measuring instrument
- BI-2500 desktop surface plasmon resonance analyzer
- Established Active Vibration Isolation Platform
- BI-4500 high-throughput fully automatic surface plasmon resonance analyzer
- TS150-HP high-power probe station
- Scanwave Scanning Microwave Near Field Impedance Microscope
- MVI scattering scanning near-field optical microscope
- TS150 6-inch manual probe station
- 4200A-SCS parameter analyzer
- F40 Microscopic Film Thickness Measuring Instrument
- Zeta20 multi-mode 3D optical profilometer
Shanghai Nateng Instrument Co., Ltd
Vista-IR High Resolution Nanoinfrared Imaging and Spectroscopy System
NegotiableUpdate on 01/24
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Overview
Vista-IR High Resolution Nanoinfrared Imaging and Spectroscopy System
Product Details
Fourier transform infrared spectroscopy(Fourier Transform infrared spectroscopy, FTIR）Widely used in various chemical analyses, especially in the analysis of polymers and organic compounds, it provides important analytical tools for modern chemistry. However, due to the limitations of optical diffraction limits, the spatial resolution of conventional Fourier transform infrared spectrometers is increasingly unable to meet the needs of researchers for chemical analysis and component identification of samples at the nanoscale. In this context, the United StatesMolecular VistaAs a result, a new generation was launchedNano infraredImaging and Spectroscopy SystemVista-IR！
Vista-IRNanoinfrared relies on the atomic force microscope platform and utilizes specializedLight induced force microscope（Photo-induced Force Microscope, PiFM)Technology, combined with wavelength adjustable infrared light sources, to achieve10nmThe following spatial resolutionsinfraredImaging and spectral acquisition, without the need for far-field optical receivers and interferometers.
The PiFM infrared spectrum collected by Vista-IR nanoinfrared is highly consistent with the standard FTIR spectrum, which allows researchers to compare and analyze the PiFM nanoinfrared spectrum with the data in the FTIR infrared spectrum library.
NanoIR Nanoinfrared Imaging and Spectroscopy Case Study Breakthrough use of light induced force microscopy to detect the interaction between probes and samplesDipole interaction(dipole interaction)， Protect it from the negative impact of lateral thermal expansion of the sample on spatial resolution. Therefore,The true realization of spatially resolved nanoinfrared imaging below 10nm based on light induced force microscopy!The example of nanoscale infrared imaging and spectroscopy of PS-PMMA block copolymer is shown below, with red and green representing the distribution of PMMA and PS, respectively.
Nano infrared based on light induced force microscopy is not only suitable forpolymer materials, also suitable forInorganic materialsThe following figure shows the nano infrared skeleton vibration peaks of ZSM-5 zeolite molecular sieves with different Si/Al ratios1100cm-1The blue shift and splitting situation at the location, as well as the presence of hydrocarbons at 1480cm-1The C=C stretching vibration peak is used to reflect the participation of ZSM-5Methanol to hydrocarbons (MTH)The distribution of coking after catalytic reaction.
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