F60 Fully Automatic Film Thickness Tester

1brief introduction

KLA's Filmetrics series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range from nm to mm. It can achieve accurate measurement of film thickness for materials such as photoresist, oxides, silicon or other semiconductor films, organic films, conductive transparent films, etc. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has multiple products including F10-HC, F20, F32, F40, F50, F60-t, etc. It can measure samples ranging from a few millimeters to 450mm in size, with a film thickness measurement range of 1nm to mm. The Filmetrics F60 series products can measure film thickness and refractive index like the F50 product, but it adds many features for production environments. These features include automatic groove detection, automatic benchmark determination, fully enclosed measurement platform, pre installed software industrial computers, and models upgraded to fully automated wafer transfer. Different F60-t instruments are distinguished based on their wavelength range. Shorter wavelengths (such as F60-t-UV) are generally used to measure thinner films, while longer wavelengths can be used to measure thicker, more uneven, and opaque films. .

measuring principle-Spectral reflection

spectrumellipsometer(SE) and Spectral Reflectometer (SR) both use the analysis of reflected light to determine the thickness and properties of dielectrics, semiconductors, and metal thin filmsrefractive indexThe main difference between the two is that ellipsometers measure small angles fromfilmReflected light, while a spectral reflectometer measures light reflected vertically from a thin film. Spectral reflectometry measures vertical light and ignores polarization effects (the vast majority of thin films are rotationally symmetric). Because it does not involve any mobile devices, the spectral reflectometer has become a simple and low-cost instrument. Spectral reflectometry can be easily integrated with more powerful transmittance analysis. Spectral reflectometry is usually the preferred method for thin film thicknesses exceeding 10um, while ellipsometry focuses on film thicknesses thinner than 10nm. Both techniques are available for thicknesses between 10nm and 10um. Moreover, spectral reflectometers that are fast, simple, and cost-effective are usually a better choice.

IImajor function

Measure thickness, refractive index, reflectivity, and transmittance

Single layer or multi-layer film stacking

Automatic groove detection

Automatic benchmark determination

Fully automated wafer transfer

lTechnical capabilities

Spectral wavelength range: 190-1700 nm

Thickness measurement range: 5nm-450 μ m

Integrated platform/spectrometer/light source device (excluding platform)

4',6' and 200mm

Reference waferTS-SiO2-4-7200

Thickness standard

vacuum pump