F30 online film thickness tester

NegotiableUpdate on 01/24

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Overview

F30 online film thickness tester

Product Details

1brief introduction

KLA's Filmetrics series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range from nm to mm. It can achieve accurate measurement of film thickness for materials such as photoresist, oxides, silicon or other semiconductor films, organic films, conductive transparent films, etc. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has multiple products including F10-HC, F20, F32, F40, F50, F60-t, etc. It can measure samples ranging from a few millimeters to 450mm in size, with a film thickness measurement range of 1nm to mm. The Filmetrics F30 series products measure deposition rate, deposition layer thickness, optical constants (n and k values), and uniformity of semiconductor and dielectric layers in real-time through a spectral reflectance system in metal organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), and other deposition processes. The measured thin films can be smooth and semi transparent, or lightly absorbed F30 can detect and monitor reflectance, thickness, and deposition rate through molecular beam epitaxy and metal organic chemical vapor deposition techniques. This actually includes any semiconductor material from gallium nitride aluminum to gallium indium phosphorus arsenic.

measuring principle-Spectral reflection

spectrumellipsometer(SE) and Spectral Reflectometer (SR) both use the analysis of reflected light to determine the thickness and properties of dielectrics, semiconductors, and metal thin filmsrefractive indexThe main difference between the two is that ellipsometers measure small angles fromfilmReflected light, while a spectral reflectometer measures light reflected vertically from a thin film. Spectral reflectometry measures vertical light and ignores polarization effects (the vast majority of thin films are rotationally symmetric). Because it does not involve any mobile devices, the spectral reflectometer has become a simple and low-cost instrument. Spectral reflectometry can be easily integrated with more powerful transmittance analysis. Spectral reflectometry is usually the preferred method for thin film thicknesses exceeding 10um, while ellipsometry focuses on film thicknesses thinner than 10nm. Both techniques are available for thicknesses between 10nm and 10um. Moreover, spectral reflectometers that are fast, simple, and cost-effective are usually a better choice.