Two-photon polymerization

NegotiableUpdate on 02/10

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Two Photon Aggregation 3D Processing, Two Photon Aggregation-MPD: True 3D Maskless Lithography, capable of manufacturing high degree of freedom nanoscale 3D structures with a minimum feature size of up to 50nm. It provides excellent high-precision, 3D manufacturing solutions for research and development in multiple fields, including but not limited to micro nano optical devices, micro/nanofluidic chips, on-chip optical interconnects, and micromechanics.

Product Details

Two-photon polymerization_MPDTrue 3D maskless lithography can achieve high degree of freedom nanoscale 3D structure manufacturing, with a minimum feature size of up to 50nm. It provides excellent high-precision, 3D manufacturing solutions for research and development in multiple fields, including but not limited to micro nano optical devices, micro/nanofluidic chips, on-chip optical interconnects, and micro mechanics.

Two-photon polymerization_MPDparameter

system parameters		MPD-100 sub series	MPD-1000 sub series	MPD-2000 sub series
Minimum horizontal feature size (nm)		XY≤80	XY≤80	XY≤50
Horizontal minimum period/resolution (nm)		XY≤300	XY≤300	XY≤200
Splicing accuracy (nm)		≤ 200
Maximum surface roughness (nm)		≤5
Note: The above values are only typical ranges for each parameter and are not limit values. Example: The minimum feature size xy ≤ 80nm, and the actual minimum achievable feature size is below 80nm.
Featured features and configurations (x - not included in standard machine, √ - standard machine configuration, ○ - optional)		MPD-100 sub series	MPD-1000 sub series	MPD-2000 sub series
High precision focusing	Accuracy ≤ 25nm, compatible with transparent/opaque substrates such as silicon, glass, sapphire, etc	√	√	√
Focal spot/aberration control		×	○	√
3D Confocal Focus		×	○	○
Three dimensional alignment		×	○	○
Multi parameter preview		√	√	√
Script function		√	√	√
intelligent strategy	1. Contour/Shell - Fill; 2. Arbitrary/Custom Sequence Mode 3. Dynamic focal spot control (grayscale) 4. Adaptive layer cutting 5. Vector processing mode	√	√	√
Fixture/substrate	1. Including but not limited to metals, glass (quartz), sapphire, silicon wafers, etc 2. Compatible with multiple substrate fixation modes: adsorption table, clamping, magnetic attraction 3. Supporting/customized fiber optic fixtures	√	√	√


Focal plane monitoring		√	√	√
Energy monitoring		√	√	√
Accessibility	Anchor point, measurement, marking, tilt compensation, rotation, etc	√	√	√
Photoresist/material	1. Self developed two-photon photoresist, HBP, PPI Dip, HBO-2, etc 2. Compatible with third-party two-photon photoresist; Other UV curable materials include but are not limited to AZ series and SU8 series 3. Support the printing of biocompatible hydrogel materials 4. Support glass, PDMS, and various precursor photoresists	√	√	√
Extension Function 1: Automatic Glue Injection		○	○	○
Extension Function 2: Fluorescence Confocal		×	○	○
Extension Function 3: Multi channel Expansion		○	√	√
Hardware configuration information (x - standard machine not included, √ - standard machine configuration, ○ - optional)		MPD-100 sub series	MPD-1000 sub series	MPD-2000 sub series
Focusing on the system		Standard configuration: Comprehensive magnification of 66 times, NA 1.42。 (Other magnifications and requirements can be customized)
Femtosecond Lasers		Center wavelength: 515nm/780nm (optional) Average power: ≥ 1W Pulse width: ≤ 200fs Repetition frequency: 80MHz
translation stage		XYZ行程： 100mm×100mm×25mm
High precision Z-axis		Journey: 75 μ m; Accuracy: ≤ 10nm
Temperature Control System		○	Environmental temperature control system with an accuracy of ± 0.1 ℃ (the temperature reference value is the same as that of the external laboratory, and the external laboratory needs to ensure temperature stability better than ± 1 ℃)
Vibration isolation system		○	Configure multi-level active/passive isolation system
Installation conditions (the following are recommended conditions, more detailed parameters can be discussed with the manufacturer)		MPD-100 sub series	MPD-1000 sub series	MPD-2000 sub series
Electrical conditions	power supply conditions	Power supply line 6 square meters, 220V, 50Hz, 16A
	Peak power/operating power	4kW/1kW	8kW/4kW
environmental conditions		Yellow light, cleanroom of 10000 level or above, vibration isolation level priority over VC-C, laboratory room temperature, recommended 21-23 ℃
compressed air		Not mandatory, only for active vibration isolation and adsorption table fixtures
Recommended usage area		2m×2m
Overall dimensions	Equipment body (mm, width x depth x height)	785×940×720	1300 × 1300 × 2200 (excluding constant temperature module 1900)
	Cabinet (mm, width x depth x height)	620×800×1600	620×800×1600
Total weight (kg)		＜600	＜1200