Single target magnetron fiber winding sputtering coating instrument

Single target magnetron fiber winding sputtering coating instrumentSpecially designed for fiber optic film preparation, it adopts a stainless steel high vacuum chamber and is equipped with an observation window with a baffle to observe the coating process. The baffle can effectively prevent the observation window from being obscured by the film layer, making it easy to observe and record experiments. The top opening design on the cavity is convenient to open and easy to clean, making it very suitable for laboratory use. The whole machine adopts modular design, with simple operation logic and intuitive operation interface, which is easy to get started with

Single target magnetron fiber winding sputtering coating instrumentIt is a common physical vapor deposition (PVD) technique used to prepare various thin film materials. Its working principle is to use a technique called magnetron sputtering to sputter high-purity metal or alloy targets to generate ions and neutral atoms, which are then deposited on a substrate to form a thin film. In this sputtering system, a single target material, usually a disc-shaped metal or alloy, is used to accelerate and spray particles on the surface of the target material towards the substrate by applying high voltage and magnetic field to the target material. Due to the fact that the substrate is usually treated at high temperatures, sputtered metal particles will rapidly diffuse and form a uniform thin film.

In order to increase sputtering rate and film quality, fiber winding technology has been introduced. In fiber winding technology, fibers are wound between the target material and the substrate to form a thin gap. By adjusting the distance between the target material and the substrate and controlling the sputtering energy, the thickness and composition of the thin film deposited on the substrate can be more effectively controlled.

Fiber optic wire winding sputtering coating instrument is a device used for preparing thin films. It can form a uniform, dense, thin, and specific film layer on the substrate surface.

This sputtering system is highly suitable for preparing high-quality, high-purity, and uniform metal and alloy thin films, and is widely used in fields such as microelectronics, optics, batteries, and solar cells.

1. Preparation of optical thin films: used for making high reflection, anti reflection and other optical thin films.

2. Electronic device preparation: used for preparing semiconductor devices, conductive films, etc.

3. Preparation of optical devices: Used for the preparation of solar cells, liquid crystal displays, LEDs, and other devices.

4. Preparation of protective coating: Used to prepare coatings with waterproof, oil resistant, UV resistant, wear-resistant and other properties.

In general, fiber optic sputtering coating equipment is widely used for thin film preparation in scientific research and industrial fields.

Technical parameters of fiber optic coating instrument: