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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China
Product Categories
- Z-series stereomicroscope Leica Z6 APO
- F30 online film thickness tester
- F60 Fully Automatic Film Thickness Tester
- Diener NANO plasma cleaning machine
- Vista-IR High Resolution Nanoinfrared Imaging and Spectroscopy System
- LF-2000 Integrated In Situ Nanomanipulation Machine
- 6-inch nanoimprint machine NIL-150
- Passive isolation table GWA-TM
- High precision nano stretching system Nano UTM T150
- RSA5000 series spectrum analyzer
- TTR500 Series Vector Network Analyzer (VNA)
- MTA02 Micro Force Displacement Test Control System
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- DV-502 Thermal Evaporation Thin Film Deposition
- Desktop Pro Thin Film Deposition - Magnetron Sputtering
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- Desk V Thin Film Deposition Solution
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- Duramin-4 hardness tester
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- Active isolation table ARISTT
- Active isolation table ARISMD
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- Passive isolation table GWA-M
- Passive isolation table GWA-TO
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- Diener Pico plasma cleaning machine
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- FT-NMT04 Nano Mechanical Performance Testing System
- ACCUTOM-10/-100 cutting equipment
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- EZ series stereomicroscope
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- Leica M Series Stereoscopic Microscope LeicaM165FC/205FA
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- Leica M Series Stereoscopic Microscope LeicaM125/165C/205C/205A
- DM750P professional polarizing microscope
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- MPI Titan RF Accessories
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- Silicon nitride thin film window
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- Duramin-40 hardness tester
- 4-inch nanoimprint machine NIL-100
- Leica room temperature ultra-thin slicer Leica EM UC7
- Film thickness measuring instrument
- BI-2500 desktop surface plasmon resonance analyzer
- Established Active Vibration Isolation Platform
- BI-4500 high-throughput fully automatic surface plasmon resonance analyzer
- TS150-HP high-power probe station
- Scanwave Scanning Microwave Near Field Impedance Microscope
- MVI scattering scanning near-field optical microscope
- TS150 6-inch manual probe station
- 4200A-SCS parameter analyzer
- F40 Microscopic Film Thickness Measuring Instrument
- Zeta20 multi-mode 3D optical profilometer
Shanghai Nateng Instrument Co., Ltd
Silicon nitride thin film window
NegotiableUpdate on 01/24
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Overview
Silicon nitride thin film window
Product Details
Plasma can be used to clean residual organic matter, reduce field changes, and can withstand temperatures>1000 ℃ for observation in high-temperature environments. Transmission electron microscopy can withstand harsh deposition and chemical conditions, providing an ideal balance between imaging resolution and mechanical strength. Low pressure CVD and low stress are used to provide a flat, insulating, and hydrophobic surface.
For more application requirements, please call for consultation
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