SPIN450x high-quality substrate spin coating machine

Product Description

POLOS 450 Advanced Single Chip Rotary Processing Machine, desktop version, equipped with NPP casing, rotary cup, manual chemical dispensing device, and heavy-duty motor. Aerodynamic efficient chambers can improve uniformity, while natural polypropylene or stainless steel process chambers can ensure pollution-free and easy to clean process areas. All devices have programmable clockwise and counterclockwise rotation functions as well as fluid accumulation function.

Suitable for drying, rinsing/cleaning, and automatic coating processes.

Specification parameters:

• Maximum substrate size that can be processed: circular substrate diameter of 500 millimeters, square substrate size of 350 × 350 millimeters

• Material: Natural polypropylene (high-grade NPP, equipment body and all surfaces in contact with liquids)

• Configuration: Manual chemical distribution device, 2 automatic static distribution pipelines

• Cover: Pneumatic opening and closing

• Suction cup accessories: including 1 vacuum suction cup, can adapt to up to 3 wafer sizes

• Maximum speed: 1500 revolutions per minute

• Chemical distribution method: can be automatically sequentially or parallelly distributed

• Transparent cover: equipped with 6 sets of injector components around the center (each set can be independently programmed)

• Rotation function: clockwise and counterclockwise fluid accumulation rotation

• Display screen: (detachable) color touch screen with customizable icons

• Drainage interface: standard 1-inch interface

• Motor controller: Precision digital controller (maximum 1500 revolutions per minute)

• Pump module: independent module with 6 built-in peristaltic pumps