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Guangzhou Noda Electronics Co., Ltd
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Guangzhou Noda Electronics Co., Ltd

  • E-mail

    821614517@qq.com

  • Phone

    19124373227

  • Address

    301, Building B, HI Space, No. 3 Fufu Road, Yongping Street, Baiyun District, Guangzhou City

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Portable nitrogen trifluoride gas detector

NegotiableUpdate on 02/03
Model
Nature of the Manufacturer
Producers
Product Category
Place of Origin
Overview
Diffuse portable nitrogen trifluoride gas can detect the concentration of nitrogen trifluoride gas in pipelines, confined spaces, and atmospheric environments, and can be converted into corresponding standard signals (please refer to the technical parameter table for the selection of standard signal types) for unified display. It can quickly detect various toxic and harmful gases in the environment.
Product Details



Equipment parameters

Detection method

diffusion

measurement gas

Nitrogen trifluoridegas

measurement range

0-100ppm; 0-20PPM/

(Range options not listed)

Detection Principle

electrochemistry

resolution

0.01 PPM(Depending on the range)

precision

3%F.S

repetitiveness

1%F.S

display mode

2.0-inch 320 * 240 black and white dot matrix screen

police record

Built in alarm record, capable of recording alarm time and concentration

response time

30S

battery capacity

3.7VDC, 2000mA capacity polymer battery with overcharge, overdischarge, overvoltage, overheating, and short circuit protection functions

Explosion proof type

Essentially Safe Exib Ⅱ CT4Gb

Weight

0.6KG

working conditions

Temperature: Catalytic combustion: -40~+70 ℃; Electrochemistry: -20~+50 ℃;

Pressure: 86-110Kpa; Humidity: 15% RH~95% RH (no condensation)

size

LXWXH(131*66*33 mm)

data recovery

Convenient and fast, one click factory reset

standard

GB 12358-2006、

Factory accessories

Instruction manual, charger, aluminum packaging box, test report, warranty card, certificate of conformity


































  • Chinese name

NF3 is an excellent plasma etching gas in the microelectronics industry, which has a higher etching rate and selectivity for etching silicon and silicon nitride using a mixture of NF3 and CF4+O2 gas, and is non polluting to the surface. Hydrogen reacts with NF3, releasing a large amount of heat in an instant, which is the principle behind the extensive application of NF3 in high-energy chemical lasers. At high temperatures, the reaction between NF3 and organic compounds is often accompanied by explosiveness, and caution should be exercised during operation. 2. Used as high-energy fuel.