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E-mail
821614517@qq.com
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Phone
19124373227
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Address
301, Building B, HI Space, No. 3 Fufu Road, Yongping Street, Baiyun District, Guangzhou City
Guangzhou Noda Electronics Co., Ltd
821614517@qq.com
19124373227
301, Building B, HI Space, No. 3 Fufu Road, Yongping Street, Baiyun District, Guangzhou City
Equipment parameters
Detection method |
pump-suction type |
measurement gas |
Nitrogen trifluoride |
measurement range |
0-100ppm;0-20ppm;(Range options not listed) |
Detection Principle |
electrochemistry |
Testing Unit |
%VOL、%LEL、mg/m3、ppm、 Multiple units to choose from; |
resolution |
0.01ppm;(Depending on the range) |
precision |
3%F.S |
repetitiveness |
1%F.S |
display mode |
2.5-inch dot matrix display screen |
data recording |
Up to 80000 records, can be set once/1s, once/10s, or once/60s |
response time |
30S |
automatic diagnosis |
Functions such as battery level/display/sensor/hardware failure |
Explosion proof type |
Inherent safety design |
Weight |
0.26kg |
working conditions |
0~90% RH atmospheric pressure 0.1MPA temperature: -20-50 degrees |
size |
135mm in length, 65mm in height, and 35mm in width |
data recovery |
Convenient and fast, one click factory reset |
standard |
GB 12358-2006、GB 3836.1-2010、GB 3836.4-2010 |
Factory accessories |
Instruction manual, charger, aluminum packaging box, test report, warranty card, certificate of conformity |
Nitrogen trifluoride gas
NF3 is an excellent plasma etching gas in the microelectronics industry, which has a higher etching rate and selectivity for etching silicon and silicon nitride using a mixture of NF3 and CF4+O2 gas, and is non polluting to the surface. Hydrogen reacts with NF3, releasing a large amount of heat in an instant, which is the principle behind the extensive application of NF3 in high-energy chemical lasers. At high temperatures, the reaction between NF3 and organic compounds is often accompanied by explosiveness, and caution should be exercised during operation. 2. Used as high-energy fuel