Photolithography glue baking machine (wafer glue baking machine)

HTL-350 Photolithography Baking Machine (Wafer Baking Machine) Product Description:

1. Powered by NanoHeat world-class thermal technology, it emits ultra infrared radiation, has no mechanical heating components, can be dry burned, and has no electromagnetic field interference or harm,

2. The surface temperature of the board is uniform, with an accuracy of 0.1~0.3 ° C within 100 ° C and an accuracy of% 0.5 ° C within 200 ° C,

3. LED display, can set reserved temperature, built-in temperature probe and external temperature probe, can be freely switched.

4. Overtemperature alarm function, temperature timer setting function, making experiments more convenient

5. Anodizing, nano ceramic black sandblasting, high thermal emissivity, seamless heating surface, high flatness, acid and alkali resistance, corrosion resistance, no cross contamination, easy cleaning.

6. Optional with insulation cover, the entire heating area forms an insulation chamber, greatly improving temperature uniformity and also playing a role in dust prevention;

7. The machine can be equipped with negative pressure function and has several adsorption holes on the surface, which can make the heated material closely adhere to the surface of the heating plate, achieving uniform heating effect;

8. Protection from magnetic interference and hazards: making it a good choice for silicon wafer research and development, medical and laboratory use

9. Widely used for experimental heating in industries such as electronics, semiconductors, agriculture, chemistry, pharmaceuticals, biology, and new material preparation.

HTL-350 photoresist baking machine (wafer baking machine) Product features:

1. Enhance infrared heating technology,

2. It has a vacuum negative pressure function and is equipped with several adsorption holes on the surface, which can tightly adhere the heated material to the surface, thereby achieving uniform heating effect.

3. Equipped with a heating and insulation cover, the temperature can be set, and the entire heating area forms an insulation chamber, greatly improving temperature uniformity and also playing a role in dust prevention;

4. Automatic air intake function, over temperature protection function, over temperature alarm function, timing function, CE certification has been obtained, making experiments safer and more convenient!!

HTL-350 photoresist baking machine (wafer baking machine) technical parameters:

1. Heating output power: 2000W

2. Board temperature control: room temperature~350 ℃

3. Temperature control mode: LED digital display temperature can be freely set

4. Temperature testing: Built in temperature control and external temperature control can be switched

5. Temperature control accuracy: ± 0.1

6. Heating zone: 350 × 350mm (size can be customized)

7. Function options: Vacuum adsorption function: infinitely adjust the vacuum degree to make the sample heated more evenly;

8. Top pin function: diameter 3mm, height 30mm, freely set height, convenient for taking pieces, no contact with samples, avoiding contamination;

9. Limit function: Suitable for wafers of different sizes to prevent sample displacement and serve as a fixing mechanism;

10. Program segmentation control system: time setting, power output ratio setting, temperature rise curve, communication, etc

11. Product dimensions: 420 × 460 × 250mm

12. Board material: Nano ceramic sandblasted heating panel