Online nitrogen trifluoride gas detection and alarm device

NegotiableUpdate on 02/03

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Real time monitoring of nitrogen trifluoride gas

Product Details

Gas detection	Nitrogen trifluoride	quantity Cheng	0-100ppm； 0-20ppm； (More ranges can be consulted);
divide distinguish rate	0.01ppm；	Detection Principle	electrochemistry
essence degree	≤±2F. S	display mode	320 * 240 high-definition color screen
response time	T90＜30S	recovery time	≤30S（T90-T10)
service life	Sensor 2-3 years	Detection method	diffusion
heavy again sex	≤±1 %F.S	succeed electricity device	Capacity 220VAC 3A/24VDC 3A
Wireless output (Optional)	433M (≤ 3 kilometers accessible)（定制） GPRS (unlimited distance)（定制） WIFI/zigbee/LORA（定制）	Wired output (Optional)	485+switch output(Standard) 4-20mA+RS485+Switch alarm output （定制） Choose one of the above options
Protection level	IP66	Explosion-proof rating	Explosion proof type: Exd Ⅱ CT6 Gb
ruler inch	20514092mm(L×W×H)	Probe material	Aluminum alloy, stainless steel (optional)
Installation method	Wall mounted, pole mounted, pipeline mounted	heavy quantity	1KG
Working Voltage	12－35VDC， Commonly used 12VDC, 24VDC	electrical interface	Wiring port size: internal thread M20*1.5（ G1/2 Internal thread G3/4 internal thread, 1/2NPT
Standard Accessories	Detector, manual, infrared remote control, manufacturer's factory inspection report	select match document	Explosion proof sound and light alarm, installation bracket, pipeline installation accessories, etc
working environment	Temperature: Catalytic combustion: -40~+70 ℃; Electrochemistry: -20~+50 ℃; PID：-20~+50℃； Infrared: -20~+50 ℃; Fluorescence method:-20~+50℃；Zirconia: -40 ℃~+700℃ Pressure: 86-110KpaZirconia: ≤0.6Mpa) Humidity: 15% RH~95% RH (no condensation)
Product power consumption	Electrochemical sensor: P ≤ 1.2W Infrared sensor: P ≤2.0W Conventional catalytic sensor ：P ≤ 2.6W Low power catalytic sensor ：P ≤ 1.5W Thermal conductivity sensor ：P ≤2.0W
execution standard	GB15311.1-2003； GB3836.1-2010； GB3836.2-2010； GB3836.4-2010；

Nitrogen trifluoride gas

NF3 is an excellent plasma etching gas in the microelectronics industry, which has a higher etching rate and selectivity for etching silicon and silicon nitride using a mixture of NF3 and CF4+O2 gas, and is non polluting to the surface. Hydrogen reacts with NF3, releasing a large amount of heat in an instant, which is the principle behind the extensive application of NF3 in high-energy chemical lasers. At high temperatures, the reaction between NF3 and organic compounds is often accompanied by explosiveness, and caution should be exercised during operation. 2. Used as high-energy fuel