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Shenzhen Keshida Electronic Technology Co., Ltd
Widely used in carbon nanotube production equipment and industrial production equipment.
The flat infrared heating reactor can be used for annealing treatment systems of 50-300mm round crystals and industrial production baking lines.
Heating large-area substrates (Solar cell solar panels, FPD flat panel displays) High temperature rapid heating of semiconductor round crystals Annealing of thin metal sheets Ps type has a 40mm wide gold reflective surface Pss type has a 20mm wide gold reflective surface, which can achieve dense installation of lamps Ps type and Pss type can be assembled for large-area heating; *Model Description: Taking Ps (s) 35V as an example: P Parabolic reflector, s 40mm wide (ss: 20mm wide), 3 Number of light tubes; , 5 : Lamp length; , V : Planar radiation heating The furnace requires cooling water during operation;purpose
specialty
Specification
model*1
Heating method
Maximum heating temperature
Heating length
(Lamp length)voltage
power
Ps15V
Planar radiation heating
1
140mm
200V
1.2kW
Ps110V
265mm
2.0kW
Ps116V
420mm
300V
3.0kW
Ps35V
3
140mm
200V
3.6kW
Ps310V
265mm
6.0kW
Ps316V
420mm
300V
9.0kW
Pss35V
140mm
200V
3.6kW
Pss38V
200mm
4.8kW
Pss310V
265mm
6.0kW
Pss316V
420mm
300V
9.0kW
The heating temperature or heating rate varies depending on the infrared reflectivity, absorptivity, heat capacity, and material of the heated sample.
For other configuration requirements, please contact us.