Ion beam etching/deposition system

EIS-200 is a small ion beam etching system based on electron cyclotron resonance (ECR) technology launched by Elionix, which is particularly suitable for research purposes such as ion beam etching, thinning, cleaning, deposition, etc.

EIS-200Principle:

Using ECR technology to generate high-energy Ar+ion beams, the Ar+ion beams are accelerated by an electric field to reach the surface of the sample, and physically bombard the sample to achieve etching effect.

EIS-200It has the following advantages:

Good directionality, anisotropy, high steepness, and less lateral etching

High resolution

Not limited by etching materials, it can etch materials such as quartz

Controllable etchingTaperhorn

Ÿ

Various experimental conditions can be setŸNPD (Nanopatterned Film Forming Unit)

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Options (as shown in the figure below)

major function

Nano scale pattern etching

High aspect ratio etching

Ion beam deposition

Surface cleaning

Ion thinning

Technical Capability

applicationNano scale pattern etching, high aspect ratio etching, surface cleaning, ion thinning, etc

ŸSiO2on Si substrate

ŸDiamond

Substrate(Diamond)