Focused ion beam and scanning electron microscope - FIB-SEM

NegotiableUpdate on 01/13

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Overview

Zeiss Crossbeam combines the powerful imaging and analytical performance of field emission scanning electron microscopy (FE-SEM) barrels with the excellent processing capabilities of the new generation focused ion beam (FIB). Whether it's cutting, imaging, or 3D analysis, the Crossbeam series can greatly enhance your application experience.

Product Details

Specially designed for high-throughput3DTailored for analysis and sample preparationFIB-SEMZeiss Crossbeam combines the powerful imaging and analytical performance of field emission scanning electron microscopy (FE-SEM) barrels with the excellent processing capabilities of the new generation focused ion beam (FIB). Whether it's cutting, imaging, or 3D analysis, the Crossbeam series can greatly enhance your application experience. With the Gemini electron optics system, you can obtain authentic sample information from scanning electron microscopy (SEM) images. The Ion scuttor FIB tube has introduced a new FIB processing method, which can reduce sample damage, improve sample quality, and accelerate the experimental process.

Whether used in scientific research institutions or industrial laboratories, single user laboratories or multi-user experimental platforms, if you want to obtain high-quality, high impact experimental results, the modular platform design of Zeiss Crossbeam allows you to upgrade the instrument system at any time according to your own needs.

Technical Specifications:

	Zeiss Crossbeam 350	Zeiss Crossbeam 550
Scanning Electron Microscope (SEM)	Gemini I tube	Gemini II tube
	Variable air pressure option	Optional Tandem Decol
	Electron beam current: 5 pA-100 nA	Electron beam current: 10 pA-100 nA
Focused ion beam （FIB）	Resolution: 3 nm @ 30 kV (statistical method)	Resolution: 3 nm @ 30 kV (statistical method)
Focused ion beam （FIB）	Resolution: 120 nm @ 1 kV&10 pA (optional)	Resolution: 120 nm @ 1 kV&10 pA
detector	Inlens SE, Inlens EsB, VPSE (Variable Pressure Secondary Electron Detector), SESI (Secondary Electron Secondary Ion Detector), aSTEM (Scanning Transmission Electron Detector), aBSD (Backscatter Detector)	Inlens SE, Inlens EsB, ETD (Everhard Thornley detector), SESI (secondary electron secondary ion detector), aSTEM (scanning transmission electron detector), aBSD (backscatter detector), and CL (cathodoluminescence detector)
Sample warehouse specifications and ports	The standard sample compartment is equipped with 18 configurable interfaces	The standard sample compartment is equipped with 18 configurable interfaces/the large sample compartment is equipped with 22 configurable interfaces
Carrier platform	X /Y = 100 mm	X/Y = 100 mm / X/Y = 153 mm
	Z = 50 mm，Z' = 13 mm	Z = 50 mm，Z' = 13 mm / Z = 50 mm，Z' = 20 mm
	T=-4 ° to 70 °, R=360 °	T=-4 ° to 70 °, R=360 °/T=-15 ° to 70 °, R=360 °
Charge control	Electron beam gun	Electron beam gun
	Local charge neutralizer	Local charge neutralizer
	variable pressure	-
gas	Single channel gas injection system: Pt, C, SiOx, W, H2O	Single channel gas injection system: Pt, C, SiOx, W, H2O
gas	Multi channel gas injection system: Pt, C, W, Au, H2O, SiOX, XeF2	Multi channel gas injection system: Pt, C, W, Au, H2O, SiOX, XeF2
Storage resolution	32 k x 24 k (using the optional ATLAS 5 3D tomography module, up to 50 k x 40 k)	32 k x 24 k (using the optional ATLAS 5 3D tomography module, up to 50 k x 40 k)
Optional analysis attachments	EDS、EBSD、WDS、SIMS， If necessary, other options can also be provided	EDS、EBSD、WDS、SIMS， If necessary, other options can also be provided
advantage	Due to the use of variable pressure mode and extensive in-situ experiments, sample compatibility can be significantly expanded.	High throughput analysis and imaging can be achieved, and high resolution can be obtained under various conditions.

聚焦离子束和扫描电子显微镜 – FIB-SEM