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Shanghai Nateng Instrument Co., Ltd
Film thickness measuring instrument
NegotiableUpdate on 01/24
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Overview
Film thickness measuring instrument
Product Details
KLA's Filmetrics series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range from nm to mm. It can achieve accurate measurement of film thickness for materials such as photoresist, oxides, silicon or other semiconductor films, organic films, conductive transparent films, etc. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has multiple products including F10-HC, F20, F32, F40, F50, F60-t, etc. It can measure samples ranging from a few millimeters to 450mm in size, with a film thickness measurement range of 1nm to mm. Filmetrics F10-RT is designed for vacuum coating, and reflection and transmission spectra can be obtained with just a click of the mouse. No need to spend time changing hardware configuration, F10-RT-UV can simultaneously collect reflection and transmission spectra with just a click of the mouse. In less than a second, the array spectrometer can quickly collect data. In addition, Filmetrics' dedicated Autobaseline design can reduce the parameter reading time for benchmark calibration by more than ten times. For only a small fraction of the traditional price, users can conduct minimum/maximum analysis, determine FWHM, and perform color analysis. The optional thickness and refractive index modules allow you to fully utilize the analytical capabilities of Filmetrics F10. The measurement results can be quickly exported and printed.
1major function
lMain applications
Simultaneous measurement of reflectivity and transmittance of thin films
Color analysis of spatial color system
Multi layer thin film analysis capability
Film thickness and parameter calculation module
lTechnical Capability
Spectral wavelength range: 380-1050 nm
Thickness measurement range: 15nm-70 μ m
Minimum thickness for measuring n&k: 100 nm
Accuracy: Take the larger value, 2nm or 0.4%
Accuracy: 0.1nm
Stability: 0.07nm
Spot size: 6mm
IIapplication
Semiconductor manufacturing: photoresist, oxide, nitride
LCD display: LCD gap, polyimide protective film, nano indium tin metal oxide
Biomedical components: polymer/poly (p-xylene) coating, biofilm/bubble ball thickness, drug coated stent
Micro electromechanical systems: silicon film, aluminum nitride/zinc oxide thin film filters
Optical coating: hard coating, anti reflective coating, Filters filter
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