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Zhengzhou Chengyue Scientific Instrument Co., Ltd

  • E-mail

    wjb@cykeyi.com

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    13837189935

  • Address

    201, 2nd Floor, Building 5, Zhengzhou Yida Technology New City, Jinzhan Street, High tech Zone, Zhengzhou City

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Fiber winding single target magnetron sputtering coating instrument

NegotiableUpdate on 01/08
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Overview
The fiber winding single target magnetron sputtering coating instrument is a device used for preparing thin films. It can form a uniform, dense, thin, and specific film layer on the substrate surface.
Product Details

Fiber winding single target magnetron sputtering coating instrumentIt is a common physical deposition (PVD) technique used to prepare various thin film materials. Its working principle is to use a technique called magnetron sputtering to sputter high-purity metal or alloy targets to generate ions and neutral atoms, which are then deposited on a substrate to form a thin film. In this sputtering system, a single target material, usually a disc-shaped metal or alloy, is used to accelerate and spray particles on the surface of the target material towards the substrate by applying high voltage and magnetic field to the target material. Due to the fact that the substrate is usually treated at high temperatures, sputtered metal particles will rapidly diffuse and form a uniform thin film.

In order to increase sputtering rate and film quality, fiber winding technology has been introduced. In fiber winding technology, fibers are wound between the target material and the substrate to form a thin gap. By adjusting the distance between the target material and the substrate and controlling the sputtering energy, the thickness and composition of the thin film deposited on the substrate can be more controlled.

Fiber winding single target magnetron sputtering coating instrumentIt is a device used for preparing thin films. It can form a uniform, dense, thin, and specific film layer on the substrate surface.

This sputtering system is highly suitable for preparing high-quality, high-purity, and uniform metal and alloy thin films, and is widely used in fields such as microelectronics, optics, batteries, and solar cells.

1. Preparation of optical thin films: used for making high reflection, anti reflection and other optical thin films.

2. Electronic device preparation: used for preparing semiconductor devices, conductive films, etc.

3. Preparation of optical devices: Used for the preparation of solar cells, liquid crystal displays, LEDs, and other devices.

4. Preparation of protective coating: Used to prepare coatings with waterproof, oil resistant, UV resistant, wear-resistant and other properties.

In general, single target magnetron fiber wound sputtering coating equipment is widely used for thin film preparation in scientific research and industrial fields.

光纤绕丝单靶磁控溅射镀膜仪

Technical parameters of single target magnetron fiber winding sputtering coating instrument:

Product Model

CY-MSZ180-I-DC-SS

power supply voltage

AC220V,50Hz

Total machine power

2kw

Wire winding mechanism

size

Φ15mmx245mm

Wire winding speed

1-300r/min

Magnetron sputtering head

quantity

2 inches x 1

cooling method

water cooling

Vacuum Chamber

Cavity Size

Φ213mmX307mm

Observation window

φ80mm

Opening method

Top opening, left opening

Material of the cavity

Stainless Steel 304

power configuration

Quantity of DC power supply

1 unit

output power

≤300W

matching method

auto-match

water cooling system

Water tank capacity

9L

traffic

10L/min

gas supply system

type

Manual micro regulating valve

vacuum system

fore pump

Bipolar rotary vane pump

pumping speed

1.1L/s

Secondary pump

Turbo molecular pump

pumping speed

60L/s

air extraction port

ISO63

air vent

KF16

vacuum gauge

Composite vacuum gauge