F3 Single Point Film Thickness Tester

KLA's Filmetrics series utilizes spectral reflectance technology to achieve precise measurement of film thickness, with a measurement range from nm to mm. It can achieve accurate measurement of film thickness for materials such as photoresist, oxides, silicon or other semiconductor films, organic films, conductive transparent films, etc. It is widely used in semiconductor, microelectronics, biomedical and other fields. Filmetrics has multiple products including F10-HC, F20, F32, F40, F50, F60-t, etc. It can measure samples ranging from a few millimeters to 450mm in size, with a film thickness measurement range of 1nm to mm. F3-sX can test the thickness of numerous semiconductor and dielectric layers, with a maximum thickness of up to 3 millimeters. The F3-sX series is equipped with a test spot diameter of 10 microns, allowing for quick and easy measurement of material film layers that cannot be measured by other film thickness testing instruments.

Measurement principle - Spectral reflectance

Spectral ellipsometer (SE) and spectral reflectometer (SR) both use the analysis of reflected light to determine the thickness and refractive index of dielectric, semiconductor, and metal thin films. The main difference between the two is that ellipsometers measure light reflected from thin films at small angles, while spectrometers measure light reflected vertically from thin films. Spectral reflectometry measures vertical light and ignores polarization effects (the vast majority of thin films are rotationally symmetric). Because it does not involve any mobile devices, the spectral reflectometer has become a simple and low-cost instrument. Spectral reflectometry can be easily integrated with more powerful transmittance analysis. Spectral reflectometry is usually the preferred method for thin film thicknesses exceeding 10um, while ellipsometry focuses on film thicknesses thinner than 10nm. Both techniques are available for thicknesses between 10nm and 10um. Moreover, spectral reflectometers that are fast, simple, and cost-effective are usually a better choice.

1、 Main functions

Main applications

Measure the thickness, refractive index, reflectivity, and transmittance of thicker films:

Technical capabilities

Spectral wavelength range: 380-1580 nm

Thickness measurement range: 10nm-3mm

Minimum thickness for measuring n&k: 50 nm

Accuracy: Take the larger value, 50nm or 0.2%

Accuracy: 5nm

Stability: 5nm

Spot size: 10 µ m

Sample size: diameter ranging from 1mm to 300mm or larger

2、 Application

Semiconductor thin films: photoresist, process thin films, dielectric materials

LCD display: OLED, glass thickness ITO

Optical coating: hard coating thickness, anti reflective coating

Polymer film: PI, PC