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Room 707, Aiqian Building, 599 Lingling Road, Xuhui District, Shanghai, China
Product Categories
- Z-series stereomicroscope Leica Z6 APO
- F30 online film thickness tester
- F60 Fully Automatic Film Thickness Tester
- Diener NANO plasma cleaning machine
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- Film thickness measuring instrument
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- MVI scattering scanning near-field optical microscope
- TS150 6-inch manual probe station
- 4200A-SCS parameter analyzer
- F40 Microscopic Film Thickness Measuring Instrument
- Zeta20 multi-mode 3D optical profilometer
Shanghai Nateng Instrument Co., Ltd
EUV/X-ray reflector
NegotiableUpdate on 01/24
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Overview
EUV/X-ray reflector
Product Details
XUVmanyLayer reflector
X-ray multilayer reflector
Application examples Substrate material Typical wavelength XUV（EUV）Reflector mirror EUVPhotolithography Application of high-order harmonics Aces Science XX-ray laser Multi-layer reflector Mp/Si Ru/Si Zr/Al SiC/Mg Cr/C 50Electron voltage to100Electronic voltage 50Electron voltage to100Electronic voltage 50Electron voltage to70Electronic voltage 25Electron voltage to50Electronic voltage to300Electronic voltage Single-layer reflector SiC Pt Ru 10Electron voltage to100Electronic voltage XX-ray reflector Synchrotron applications XFELapplication built-inXX-ray non-destructive testing equipment Multi-layer reflector W/C W/B4C Ru/C Pt/C 1kElectron voltage to30kElectronic voltage Single-layer reflector C B4C SiC Cr Ni 1kElectron voltage to30kElectronic voltage XUVMulti-layer reflector describe Substrate shape: flat, convex, concave, parabolic, toroidal, ellipsoidal Substrate materials: quartz, siliconzero dewerWait, wait Multilayer film material:Mo/Si、Ru/Si、Zr/Al、SiC/Mg、Cr/CWait, wait Substrate size: φ3Millimeter to φ300MillimeterMo/SiMultilayer mirrors have close proximity13Nano（90High reflectivity at the wavelength of electron volts.NTT-ATofMo/SiMultilayer mirrors have a high70%The normal incidence reflectance.NTT-ATofXUVThe material, film structure, and substrate shape of the reflector can be customized to meet the needs of users regarding center wavelength and optical devices. Substrate shape: flat, ellipsoidal, parabolic, cylindrical, toroidal Substrate: Quartz, Siliconzero dewerWait, wait Substrate material:W/B4C、W/C、Pt/CWaiting for substrate size: maximum500MillimeterNTT-ATprovideK-BMirror systems, Walter mirrors, etc XX-ray multilayer reflector describe Reflectance, pink; Calculated reflectivity, period length:2.95Nano)W/B4CMulti layer andW/CMultilayer film reflector for hardXRadiation applications have high reflectivity. In order to effectively reflect and gather hardnessXRadiation must minimize the angle of incidence as much as possible. This requires a longer length of the reflector and a smaller perimeter of the multilayer film. Single-layer reflector describe Substrate shape: flat, ellipsoidal, parabolic, cylindrical, toroidal Substrate materials: quartz, siliconzero dewerWait, wait Multilayer materials:C、B4C、SiC、Ru、NbN、PtWait, wait Substrate size: maximum500Millimeter Using a single-layer mirror with total reflection for beam control, light aggregation, and removalXUVtoXNo wavelength required within the radiation range.NTT-ATThe material and substrate shape of the single-layer reflector can be customized to meet the needs of users regarding the center wavelength and optical device. Elliptical mirror with ruthenium layer
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