Double prism ultra wide continuous spectrum monochromator

The emergence of DPM100 dual prism ultra wide continuous spectrum monochromator has successfully broken the limitations of traditional monochromators in terms of spectral range and stray light, bringing significant improvements to the application of spectroscopy technology. It covers an ultra wide spectrum of 0.4-7.3 eV and can continuously measure from infrared to deep ultraviolet bands. Its ability to suppress stray light reaches 8 orders of magnitude, and it also has the advantages of high resolution and efficient measurement.

Emerging from the cocoon | DPM100Double prism ultra wide continuous spectrum monochromator

At the forefront of materials science, spectroscopic techniques - including surface photovoltage (SPV), photocurrent spectroscopy (PCS), photoelectron emission spectroscopy (PES), optical transmission spectroscopy (OTS), etc. - are gradually becoming a new standard for detecting semiconductor defect states. However, traditional monochromators are limited by spectral range and stray light interference, making it difficult to achieve continuous and high-precision measurements, which to some extent restricts the application potential of related technologies. Now, this limitation has been overcome: developed by the Helmholtz Zentrum team (Berlin) in collaboration with Freiberg InstrumentsDPM100Double prism ultra wide continuous spectrum monochromatorWith its ultra wide spectral range of 170-3100nm and 8 orders of magnitude advantage in suppressing stray light, it has opened up a new dimension for spectroscopic applications, especially surface photovoltage (SPV) technology.

New Product Introduction:

Traditional optical systems often rely on mirrors to change the optical path, but mirrors require precise calibration and are susceptible to vibration. The DPM100 is a monochromator based on the mirror free fused silica biprism frame design, which directly realizes the turning of light path through the total internal reflection characteristics of the prism, reducing the use of external mirrors. Realize continuous measurement from near-infrared (0.4 eV) to deep ultraviolet (7.3 eV), as shown in Figure 1. Its important innovation lies in the dual prism rotation system guided by optical rails and the design of adaptive focal length lenses, ensuring spectral resolution of meV level (such as UV region resolution as low as 7 meV). This compact instrument is optimized for high-sensitivity optoelectronic measurement and is an ideal light source for applications such as SPV.

Figure 1: Conceptual design of DPM100 ultra wide continuous spectrum monochromator, with a dual prism structure to achieve wide spectrum continuous coverage

Product Overview:

The emergence of DPM100 has successfully broken the limitations of traditional monochromators in terms of spectral range and stray light, bringing significant improvements to the application of spectroscopy technology. It covers an ultra wide spectrum of 0.4-7.3 eV and can continuously measure from infrared to deep ultraviolet bands. Its ability to suppress stray light reaches 8 orders of magnitude, and it also has the advantages of high resolution and efficient measurement. This is a strong support for spectroscopic techniques such as surface photovoltage, photoexcited transient current spectroscopy, ultraviolet photoelectron spectroscopy, and photoluminescence spectroscopy, especially in SPV technology, which can better meet the needs of semiconductor defect state detection and other scenarios, providing practical and reliable tools for the in-depth development of these spectroscopic applications.

Product advantages:

1、 Ultra wide continuous spectrum

Covering material bandgap of 0.4-7.3 eV (corresponding wavelength range: 3100-170 nm), seamless support for full band spectral measurement from infrared to deep ultraviolet, without the need to switch gratings or filters, as shown in Figure 2. This structure can avoid spectral discontinuity caused by switching gratings, and traditional equipment can achieve errors at the UV visible intersection. The ultra wide spectral range is suitable for defect full spectrum analysis of ultra wide bandgap materials such as SiC (3.3eV), GaO (4.8eV), and diamond (5.5eV).

Figure 2: Relationship between Continuous Spectrum (0.4-7.3 eV) and Intensity of Monochromator Full Band Output

2、 Mirrorless fused silica biprism architecture

Matching nitrogen purging to eliminate deep ultraviolet attenuation caused by damage to the reflector coating, this design ensures energy stability>95% across the 170-3100 nm wavelength range, while traditional equipment experiences spectral loss exceeding 60% in the wavelength range below 250 nm.

3、 Advanced ability to suppress stray light

With a suppression ability of over 8 orders of magnitude (measured stray light as low as 100 fA), it ensures the purity of spectral signals and precise detection of weak defect states.

4、 High sensitivity and efficiency

Paired with a 210 dB wide range detector (special technology DE10202303991.8), it can measure weak currents at the fA level, with a single point measurement time of only 1-7 seconds, greatly improving experimental efficiency.