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Room 707, 599 Lingling Road, Xuhui District, Shanghai
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Shanghai Nateng Instrument Co., Ltd
Desktop multi field auxiliary chemical mechanical polishing equipment
NegotiableUpdate on 05/06
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Overview
Desktop multi field auxiliary chemical mechanical polishing equipment, compatible with up to 4-inch samples, can customize special size polishing heads. 3-8 pneumatic channels. Use a specialized "two-point bead positioning" flange to set up an $r $n meter. Accurate positioning and easy disassembly. $r $n $r $n maintains independent pressure control of the ring/sample, enabling multi-stage pressure application.
Product Details
Desktop multi field auxiliary chemical mechanical polishing equipment
Desktop multi field auxiliary chemical mechanical polishing equipment, compatible with up to 4-inch samples, can customize special size polishing heads. 3-8 pneumatic channels. Use a specialized structure "two-point bead positioning" flange device
Calculate. Accurate positioning and easy disassembly.
Sample processing size: compatible with up to 4 inches, can customize special size polishing heads.
Process clamping method: manual operation.
Polishing head downforce: maximum 350N (higher pressure can be opened according to demand)
Polishing head speed: up to 120RPM (higher speed can be opened according to demand)
Disc polishing speed: up to 120RPM (higher speeds can be opened according to requirements)
Disc diameter: 300mm.
Polishing solution: 2 channels, maximum flow rate of 200mL/min (higher flow rate can be opened according to demand)
Online measurement module: motor torque, speed, air pressure, etc.
Multi field module: optional power distribution chemistry module, photocatalytic module
Maintain independent pressure control for the ring/sample, enabling multi-stage pressure application.Desktop multi field auxiliary chemical mechanical polishing equipment
