Desktop laser direct writing system

Desktop laser direct writing system

Brand:Nanyte

Origin: Singapore

NANYTEBEAMDesktop Maskless Lithography System/Desktop laser direct writing systemThe Direct Laser Writing System processes micro nano level structural patterns without the need for expensive masks. By scanning the photoresist on the substrate surface with a focused laser beam, variable dose exposure is directly applied, achieving pattern processing at the micro to nano scale. While ensuring its excellent performance, the miniaturized design makes operation more convenient and enables rapid processing, which not only improves the efficiency of micro nano device research and production, but also effectively saves costs.

The beam engine focuses the ultraviolet laser beam to the diffraction limit point, and through this focus point, the photoresist is exposed by scanning according to the designed pattern; At the same time, for large-sized wafers/substrates, multiple exposures are performed by moving the wafers/substrates with precision stepper, followed by stitching multiple exposure patterns to complete the micro nano pattern processing of the entire wafer/substrate. This beam engine is capable of processing feature linewidths less than 500nm on 6-inch wafers.

lCompact.

-Compact full-featured maskless lithography machine

lPowerful.

-Processing of feature linewidth less than 500nm

-Realize single area pattern exposure within 2 seconds

-Processing size 150mmX150mm

lUltrafast autofocus.

-Realize focusing within 1 second

-Piezoelectric driver combined with closed-loop focusing optical control

lNo-fuss multilayer.

-Realize semi-automatic multi-layer alignment within a few minutes

Software control interface:

-Humanized software interface design, WASD navigation, right-click anywhere to reach

-Automatic Image Recognition

-Realize multi-layer alignment within a few minutes

-Expose any pattern or write any text on the photoresist within seconds

-Simply load, align, and expose

-Similar toCNCNavigation operation

-During multi-layer exposure,GDSPattern visualization; The software will loadGDSMini map, one click navigation to any area on the wafer

Application example:

Pattern array on silicon substrate, with each unit measuring 50 × 63 μ m,

The spacing between adjacent patterns is 3 μ m

Photoresist: AZ5214E

Open loop resonator array, with a distance of 1.5 μ m from the right side

The separation distance on the left side is 2 μ m, and the outer ring diameter is 80 μ m

Cross capacitors (IDCs) with a gate line width of 2 μ m

Photoresist: AZ5214E

Metalized open-loop asymmetric resonator

0.8 μ m conical section, with a lateral contact electrode of 20 μ m to 90 μ m

Photoresist: AZ5214E

Application fields:

• In the field of photonics:Used for manufacturing photonic crystals, waveguides, microlenses, diffractive optical elements, etc., these elements have a wide range of applications in optical communication, optical computing, optical imaging, and other fields. For example, manufacturing micro lens arrays with specific optical properties can be used in imaging systems, optical sensors, and other devices to improve their performance and integration.

• Biomedical field:Can be used to prepare tissue engineering scaffolds, microfluidic chips, biosensors, etc.

• Microelectronics field:In integrated circuit manufacturing, laser direct writing technology is used to make masks, photoresist patterns, etc., especially for small batch, high-precision integrated circuit chip manufacturing. It has the advantages of low cost and high flexibility. In addition, it can also be used to manufacture micro electromechanical system (MEMS) devices, such as micro mechanical structures, micro sensors, micro actuators, etc.