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Shanghai Nateng Instrument Co., Ltd
Atomic layer deposition system coating machine
NegotiableUpdate on 05/06
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Overview
Atomic layer deposition system coating machine $r $n Economic scientific research deposition platform $r $n Stable film formation, uniform and reliable, material oriented research $r $n Convenient, stable, high reproducibility
Product Details
Atomic layer deposition system coating machine
Design concept
1. SE series can perform processes such as Thermal ALD, PEALD, and ALA.
The SE series has a high degree of flexibility in modification, but its performance and stability are not sacrificed as a result.
3. The atomic layer deposition system design provides convenient, stable, and highly reproducible product positioning.
Design Features
1. The modular precursor import system is easy to maintain, repair, and expand up to 4 sets of precursors, and can use low vapor pressure precursors; Diversion to avoid pipeline blockage and dust problems
2. Special design with low leakage rate, which can eliminate the influence of low-dose pollution sources on process results
3. Meet the current requirements of most material processes: Oxide or Nitride of Al, Si, Ti, Zr, Hf, etc. Metal (TBD) 4. Single system width within 54cm, laboratory friendly size
5. Special plasma source design (Remote plasma) can improve GPC by 6% (compared to ICP)
6. Special intake design improves uniformity (U%<2%) and is specially designed to address the issue of residual dead corners
Atomic layer deposition system coating machine
