ANNEALSYS vacuum rapid annealing furnace from France

Origin: AnnealSys, France;

Model: AS-One100/AS-One150

The AS-ONE vertical rapid annealing furnace is produced by AS company in France, and is divided into three models: AS-ONE 100, 150, and 200, corresponding to 4-inch, 6-inch, and 8-inch vacuum rapid annealing furnace products, respectively.

Application:

-Rapid thermal annealing RTA;

-Rapid thermal oxidation RTO;

-Diffusion, contact annealing;

-Compound semiconductor annealing;

-Nitriding, silicification;

-Selenization, sulfurization;

-Graphene deposition and carbon nanotube growth;

-Crystallization and densification;

Technical Specifications:

specification

AS-ONE 100

AS-ONE 150

Maximum sample substrate diameter

100mm (4 inches)

150mm (6 inches)

Cavity dimensions

130mm diameter x 25mm

200mm diameter x 25mm

Number of infrared lamps/maximum power

12 units/30KW

18 units/34KW

Cooling method of infrared lamp

fan

fan

Standard temperature range

Room temperature~1250 ° C

Room temperature~1200 ° C

Optional high temperature version range

Room temperature~1500 ° C

Room temperature~1300 ° C

heating rate

0.1°C ~ 200°C/s

0.1°C ~ 150°C/s

temperature control

Fast digital PID controller

Fast digital PID controller

thermocouple

K-type

K-type

pyrometer

150°C ~ 1100°C

400°C ~ 1500°C

150°C ~ 1100°C

400°C ~ 1500°C

Gas injection

Below the quartz window

Below the quartz window

Clean the gas path

Standard Configuration

Standard Configuration

Process gas path method/quantity

MFC/5-way

MFC/5-way

Vacuum acquisition system

干泵 (10-2Torr)

Molecular pump (10-6Torr)

干泵 (10-2Torr)

Molecular pump (10-6Torr)

Size

510mm x 1425mm x 800mm / 194Kg

510mm x 1425mm x 800mm / 240Kg

Reference customer:

Tsinghua University, Peking University, Fudan University, South China University of Technology, Tianjin Zhongdian 18th Institute, Nanjing Zhongdian 55th Institute, GE Shanghai R&D Center, Southern University of Science and Technology, Shenzhen University, etc.

Large sample rapid annealing furnace

Rapid Annealing Furnace (RTP/RTA) is a commonly used process equipment for semiconductor materials and devices. The rapid annealing furnace can be used in vacuum, inert atmosphere, and different process gas environments.

Instrument features:

-Rapid heat treatment, rapid thermal annealing RTP/RTA;

-Can be used in vacuum or even high vacuum environments;

-Widely used in the rapid annealing process of solar cells, such as 156mm X 156mm cells, 300mm X 300mm cells, etc;