11,11,20210From:
The new Quantum X shape system, as the second device in the Nanoscribe industrial grade maskless lithography system Quantum X platform product series, can print any structure within an area of 25 cm ², greatly promoting the rapid prototyping of complex applications in life sciences, microfluidics, and materials engineering. The Quantum X shape, as an upright printing system with automatic distribution of photosensitive resin, is very suitable for industrial batch processing and manufacturing of standard 6-inch wafers.
As a new high-precision 3D printing system launched by Nanoscribe, Quantum X shape is used for rapid prototyping and wafer level mass production to fully tap the potential of 3D micro nano processing in scientific research and industrial production. This system is a professional laser direct writing system based on two-photon aggregation technology (2PP), which can provide * design freedom for micro nano processing of 2.5D and 3D objects with sub micron precision. The Quantum X shape can achieve high-precision 3D micro nano machining on 6-inch wafers. This efficiency improvement is particularly important for wafer level mass production, which has significant implications for applications in scientific research and industrial production. In summary, this system has expanded the possibilities of 3D micro nano processing in multiple scientific research fields and industrial industries, such as life sciences, materials engineering, microfluidics, micro nano optics, micro mechanics, and microelectromechanical systems (MEMS).
Two photon polymerization (2PP) is an additive manufacturing method that can achieve the highest precision and design freedom. As the best 3D microfabrication system in its class, Quantum X shape has the following excellent performance:
*Feature size control as low as 100 nanometers in all spatial directions, suitable for nanometer and micrometer scale printing
*Produce target structures up to 50mm in size, suitable for mesoscale printing
The high-speed 3D micro nano machining system Quantum X shape can achieve excellent shape accuracy and high-precision production. This high-quality printing effect is the result of combining high-tech mirror systems and intelligent electronic system control units, while also relying on industrial grade femtosecond pulse lasers and a stable and sturdy granite operating platform. The Quantum X shape has laser focus trajectory control, which can manipulate the galvanometer to accelerate and decelerate to the optimal scanning speed, and dynamically adjust the laser power at a modulation rate of 1 MHz.
The Quantum X shape has an automatic interface search function with *, which can detect substrate surfaces with an accuracy as low as 30 nanometers. This nanometer level accuracy at the highest scanning speed, combined with a self calibration program, enables reliable and accurate printing in the shortest possible time, setting a new example for 3D micro nano processing. These excellent performances make Quantum X shape a fast prototyping and application in micro nano optics
The automatic distribution function of photosensitive resin is crucial for industrial manufacturing in wafer level processing and small batch production. Users can also directly or remotely access the Quantum X shape printing system through the device's integrated touch screen to control printing jobs. Through remote access software nanoConnectX, users can see the display options on the touch screen and control all functions, enabling them to start, monitor, and control the print job process connected to the printing system from anywhere. This allows all members of the group (such as all members of the research group's goods department) to access the printing system on their personal computers. We have achieved the goal of minimizing laboratory preparation time, simplifying and improving the efficiency of the entire preparation, execution, and monitoring of print jobs, and greatly enhancing team collaboration when sharing systems.
Quantum X shape, as an ideal rapid prototyping tool, can achieve the highest precision and high design freedom through a simple workflow. As the first two-photon grayscale lithography (2GL) launched in 2019 ®) The Quantum X shape, a product in the same series as the Quantum X system, enhances the 3D micro nano processing capability by achieving maximum precision and speed balance to achieve high-precision additive manufacturing, resulting in high levels of productivity and printing quality. In summary, the industrial grade Quantum X printing system series provides microfabrication processes for structures ranging from nanoscale to mesoscale, suitable for wafer level batch processing.
More information about 3D two-photon maskless lithography technology and product consultation
Welcome to contact Nanoscribe China Branch - Nano 3D Technology (Shanghai) Co., Ltd
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