
Pluto30It is a fully functional plasma system designed specifically for research and development,13.56MHzThe RF generator and automatic matching network power supply generate uniform plasma throughout the entire process area.Pluto30The vacuum chamber can support up to7An adjustable sample rack to accommodate samples of various shapes and sizes.Pluto30With multiple electrode settings, it can be configured toRIEandPECVDThe mode has expanded the application scope of the system and provided users with good flexibility.
A professor from the Department of Polymer Science at Fudan University hopes to conduct experiments on plasma chemical reactions using this equipment, which involves using the plasma generated by the equipment to undergo chemical reactions with substances in the vacuum chamber with the vacuum pump and gas valve closed, and then obtaining new substances produced after the chemical reaction. This experiment requires precise control of plasma equipment and high pressure holding capacity of the vacuum chamber. After conducting some research, the client ultimately chose our companyPlutoseriesPluto30Plasma surface treatment system.



Application fields:
Surface activation
Improving surface energy to enhance material adhesion: pre press mold bonding; Pre welding wire bonding
Enhance surface colloid fluidity: preform; Pre inverted chip overflow
Surface roughness and etching
Reduce surface stress and improve surface adhesion
Ashing and surface cleaning
Plasma etching (equipped with RIE configuration)
Dielectric/III-IV materials
Nano coating (equipped with liquid precursor delivery device)
Water resistant nano coating: surface treatment of printed circuit boards
Anti corrosion nano coating: medical devices, medical implants












