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Carl Zeiss (Shanghai) Management Co., Ltd
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Carl Zeiss (Shanghai) Management Co., Ltd

  • E-mail

    info.microscopy.cn@zeiss.com

  • Phone

    13761758023

  • Address

    No. 60 Meiyue Road, Pudong New Area Free Trade Zone, Shanghai

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Zeiss Double Beam Electron Microscope Crossbeam 550 Samplefab

NegotiableUpdate on 01/19
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Overview
The Zeiss Crossbeam 550 Samplefab, a focused ion beam scanning electron microscope (FIB-SEM) specifically developed for TEM sample preparation in the semiconductor industry, provides excellent flexibility, automation capabilities, and user-friendly design to help make sample preparation in the semiconductor industry simpler and more efficient.
Product Details

Zeiss dual beam electron microscopeCrossbeam 550 Samplefab

[Product Introduction]

Zeiss dual beam electron microscopeCrossbeam 550 SamplefabAs a focused ion beam scanning electron microscope (FIB-SEM) developed specifically for TEM sample preparation in the semiconductor industry, it provides excellent flexibility, automation capabilities, and user-friendly design to help make sample preparation in the semiconductor industry simpler and more efficient.


[Product Features]

l Industry standard software interface

l Optimize configuration to enhance device and software stability

l fully automaticTEMSample preparation experience

l In situ(in-situ, lift-out)Compared to non in situ(ex-situ, pick-up)Flexible and available

l High quality automatic and manual sample preparation


[Application field]

Electronics and Semiconductor Industry, Failure Analysis andTEMSample preparation.


Use fully automatic non in situ mode separately(ex-situ, pick-up)In situ(in-situ, lift-out)Sample making TEMThin slice sample

Manual final thinning7nmProcess processor, flatTEMflake

useCrossbeaminsideSTEMDetector photography