Spectral interference wafer film thickness gauge

NegotiableUpdate on 05/07

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

Spectral interference wafer film thickness gauge $r $n real-time detection of WAFER substrate film thickness during grinding process, glass substrate thickness change during thinning process (in strong acid environment). Product features Non contact, non-destructive optical film thickness detection using spectral interference method for high detection reproducibility

Product Details

Spectral interference wafer film thickness gauge

Real time detection of WAFER substrate thickness during grinding process, glass substrate thickness changes during thinning process (in strong acid environment), product features non-contact and non-destructive optical film thickness detection, using spectral interferometry to achieve high detection reproducibility

Product Features

Non contact, non-destructive optical film thickness detection
Using spectral interferometry to achieve high detection reproducibility
● Can perform high-speed real-time grinding detection
● Detection that can pass through intermediate layers such as protective films and observation windows
● Can correspond to long working distances and is easy to install in production lines or equipment
Small size, space saving, and easy equipment installation
● Can correspond to external signal triggering requirements for online detection
● Adopt a unique analytical algorithm suitable for film thickness detection.
● Automatic mapping of film thickness distribution (optional item)

Specification and style

model	SF-3/200	SF-3/300	SF-3/800	SF-3/1300
size	123（W）x 224(D)x 128(H)mm
Thickness range for silicon wafer measurement	6~400μm	10~775μm	20~1000μm	50~1300μm
Resin thickness range	10~1000μm	20~1500μm	40~2000μm	100~2600μm
Minimum sampling period	5kHz(200μsec)
repeatability accuracy	0.01% or less (* 1)
Measure the diameter of the light spot	Over 20 μ m in diameter (* 2)
measure distance	50 、80、120、150 、200mm
light source	Semiconductor light source (laser Class3B)
analytical method	FFT analysis method
interface	LAN, I/O ports
power supply	DC24V (AC power supply needs to be purchased separately)
Optional accessories	Multiple testing distance sleeves, power supply units (for AC), AL benchmarks, testing light detection targets, fiber optic cleaners

*1: The relative standard deviation of the initial standard sample measured in an air gap of approximately 1000 μ m (n=20)

*2: Design value for WD80 mm probe specification